Exploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films

Sarakinos, Kostas; Braun, Anika; Zilkens, C.; Mráz, Stanislav; Schneider, Jochen M.; Zoubos, H; Patsalas, P.

doi:10.1016/j.surfcoat.2011.11.032

Cited by 94 publications

(71 citation statements)

References 44 publications

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“…Moreover, the HiPIMS discharge, owing to its high density, may result in the generation of 9 relatively large amount of activated radicals and atoms which may result in the incorporation of these species into the film increasing its H content [7]. However, irrespective of the level of H content in our films its nearly constant values imply that the observed density increase is a direct consequence of an increase in the C-C sp 3 bond fraction.…”

Section: Resultsmentioning

confidence: 78%

“…However, this route is challenged when nonmetals such as carbon, which exhibits a significantly higher E i value of 11.26 eV, is considered. For instance, Sarakinos et al have shown that the dominant ionized species in a HiPIMS discharge are Ar + ions while C + ions constitute only ~1% of the total ionic contribution [7]. Moreover, DeKoven et al have shown that in HiPIMS discharges the C + /C ratio does not exceed 5% [8].…”

Section: Introductionmentioning

confidence: 99%

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A strategy for increased carbon ionization in magnetron sputtering discharges

Aijaz

Sarakinos

Lundin

et al. 2012

Diamond and Related Materials

105

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A strategy that facilitates a substantial increase of carbon ionization in magnetron sputtering discharges is presented in this work. The strategy is based on increasing the electron temperature in a high power impulse magnetron sputtering discharge by using Ne as the sputtering gas. This allows for the generation of an energetic C + ion population and a substantial increase in the C + ion flux as compared to a conventional Ar-HiPIMS process. A direct consequence of the ionization enhancement is demonstrated by an increase in the mass density of the grown films up to 2.8 g/cm 3 ; the density values achieved are substantially higher than those obtained from conventional magnetron sputtering methods.

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Section: Resultsmentioning

confidence: 78%

Section: Introductionmentioning

confidence: 99%

A strategy for increased carbon ionization in magnetron sputtering discharges

Aijaz

Sarakinos

Lundin

et al. 2012

Diamond and Related Materials

105

View full text Add to dashboard Cite

show abstract

“…Using magnetron sputtering based high plasma density discharges such as high power impulse magnetron sputtering (HiPIMS) [15] a higher C ionized fraction, mass density as well as sp 3 /sp 2 fraction has been obtained. However these properties are not comparable to those obtained by CVA and PLD [16,17]. In a previous study we addressed this issue by conceiving and implementing a strategy [18] which entailed increase of the electron temperature in high electron density discharge (such as HiPIMS) by using higher ionization potential buffer gas, Ne, instead of Ar.…”

Section: Introductionmentioning

confidence: 97%

Principles for designing sputtering-based strategies for high-rate synthesis of dense and hard hydrogenated amorphous carbon thin films

Aijaz¹,

Sarakinos²,

Raza³

et al. 2014

Diamond and Related Materials

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Principles for designing sputtering-based strategies for high-rate synthesis of dense and hard hydrogenated amorphous carbon thin films, Diamond and related materials, 2014. 44, pp.117-122. http AbstractIn the present study we contribute to the understanding that is required for designing sputtering-based routes for high rate synthesis of hard and dense hydrogenated amorphous carbon (a-C:H) films. We compile and implement a strategy for synthesis of a-C:H thin films that entails coupling a hydrocarbon gas (acetylene) with high density discharges generated by the superposition of high power impulse magnetron sputtering (HiPIMS) and direct current magnetron sputtering (DCMS). Appropriate control of discharge density (by tuning HiPIMS/DCMS power ratio), gas phase composition and energy of the ionized depositing species leads to a route capable of providing ten-fold increase in the deposition rate of a-C film growth compared to HiPIMS Ar discharge (Aijaz et al. Diamond and Related Materials 23 (2012) 1). This is achieved without significant incorporation of H (< 10 %) and with relatively high hardness (> 25 GPa) and mass density (~2.32 g/cm 3 ). Using our experimental data together with Monte-Carlo computer simulations and data from the literature we suggest that: (i) dissociative reactions triggered by the interactions of energetic discharge electrons with hydrocarbon gas molecules is an important additional (to the sputtering cathode) source of film forming species and (ii) film microstructure and film hydrogen content are primarily controlled by interactions of energetic plasma species with surface and sub-surface layers of the growing film.

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“…DCMS and RFMS have been widely used for a-C film growth [14,15] however, owing to their inability to generate large ionized C fluxes [8] these methods are not always suitable for synthesizing carbon-based thin films exhibiting a wide range of properties. HiPIMS has demonstrated its potential to overcome this difficulty [15,16] however, previous reports on HiPIMS-based synthesis of a-C suggest that the ionized fraction of C using HiPIMS is still much lower [15,16] than those achieved using for example cathodic arc evaporation [17][18][19]. Therefore, in order to demonstrate the viability of HiPIMS for tailor-made a-C thin film growth, the development of new strategies is required.…”

Section: Introductionmentioning

confidence: 99%

Synthesis of Carbon-based and Metal-Oxide Thin Films using High Power Impulse Magnetron Sputtering

Aijaz¹

2014

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The work presented in this thesis deals with synthesis of carbon-based as well as metaloxide thin films using highly ionized plasmas. The principal deposition method employed was high power impulse magnetron sputtering (HiPIMS). The investigations on plasma chemistry, plasma energetics, plasma-film interactions and its correlation to film growth and resulting film properties were made. The thesis is divided into two parts: (i) HiPIMSbased deposition of carbon-based thin films and (ii) HiPIMS-based deposition of metaloxide thin films.In the first part of the thesis, HiPIMS based strategies are presented that were developed to address the fundamental issues of low degree of carbon ionization and low deposition rates of carbon film growth in magnetron sputtering. In the first study, a new strategy was introduced for increasing the degree of ionization of sputtered carbon via increasing the electron temperature in the discharge by using a higher ionization potential buffer gas (Ne) in place of commonly used Ar. A direct consequence of enhanced electron temperatures was observed in the form of measured large fluxes of ionized carbon at the substrate position. Consequently, high mass densities of the resulting amorphous carbon (a-C) thin films reaching 2.8 g/cm 3 were obtained.In another study, feasibility of HiPIMS-based high density discharges for high-rate synthesis of dense and hard a-C thin films was explored. A strategy was compiled and implemented that entailed coupling a hydrocarbon precursor gas (C 2 H 2 ) with high density discharges generated by the superposition of HiPIMS and direct current magnetron sputtering (DCMS). Appropriate control of discharge density (by tuning HiPIMS/DCMS power ratio), gas phase composition and energy of the ionized depositing species lead to a route capable of providing ten-fold increase in the deposition rate of a-C film growth compared to that obtained using HiPIMS Ar discharge in the first study. The increased deposition rate was achieved without significant incorporation of H (<10 %) and with relatively high hardness (>25 GPa) and mass density (~2.32 g/cm 3 ). The knowledge gained in this work was utilized in a subsequent work where the feasibility of adding high II ionization potential buffer gas (Ne) to increase the electron temperature in an Ar/C 2 H 2 HiPIMS discharge was explored. It was found that the increased electron temperature lead to enhanced dissociation of hydrocarbon precursor and an increased H incorporation into the growing film. The resulting a-C thin films exhibited high hardness (~ 25 GPa), mass densities in the order of 2.2 g/cm 3 and H content as low as about 11%. The striking feature of the resulting films was low stress levels where the films exhibited compressive stresses in the order of 100 MPa.In the second part of the thesis, investigations on reactive HiPIMS discharge characteristics were made for technologically relevant metal-oxide systems. In the first study, the discharge characteristics of Ti-O and Al-O were investigated by studying ...

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Exploring the potential of high power impulse magnetron sputtering for growth of diamond-like carbon films

Cited by 94 publications

References 44 publications

A strategy for increased carbon ionization in magnetron sputtering discharges

A strategy for increased carbon ionization in magnetron sputtering discharges

Principles for designing sputtering-based strategies for high-rate synthesis of dense and hard hydrogenated amorphous carbon thin films

Synthesis of Carbon-based and Metal-Oxide Thin Films using High Power Impulse Magnetron Sputtering

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