1997
DOI: 10.1016/s0168-9002(97)00003-x
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Comparison of defects produced by fast neutrons and 60Co-gammas in high-resistivity silicon detectors using deep-level transient spectroscopy

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Cited by 65 publications
(31 citation statements)
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“…No significant influence of oxygen introduced by this technique on radiation hardness has been found. However, infrared spectroscopy measurements performed by ITME [4] indicate that most of the oxygen atoms were not interstitial, as would be desired for radiation hardness improvement [1,2]. Therefore, an additional experiment is currently being prepared for analysis of radiation hardness of detectors fabricated from silicon enriched with interstitial oxygen.…”
Section: Discussionmentioning
confidence: 99%
See 1 more Smart Citation
“…No significant influence of oxygen introduced by this technique on radiation hardness has been found. However, infrared spectroscopy measurements performed by ITME [4] indicate that most of the oxygen atoms were not interstitial, as would be desired for radiation hardness improvement [1,2]. Therefore, an additional experiment is currently being prepared for analysis of radiation hardness of detectors fabricated from silicon enriched with interstitial oxygen.…”
Section: Discussionmentioning
confidence: 99%
“…Two of the most challenging operation alterations owing to the radiation damage are the increase of the reverse DC current and the variation of the full depletion voltage. It has been suggested [1,2] that the electrically active defect responsible for the formation of positive space charge under bias is the divacancyoxygen complex, V 2 -O. Therefore, by increasing the concentration of oxygen and enhancing the formation of V-O complexes, it has been predicted that the concentration of vacancies will be reduced, leading to the suppression of the V 2 -O formation.…”
Section: Introductionmentioning
confidence: 99%
“…were already investigated in detail and no correlation with the "macroscopic" behavior of the diodes could be established [35][36][37][38][39][40][41][42][43][44][45][46]. The main characteristics of defects, from the electrical point of view, are the emission rates of carriers in the conduction and valence bands given by:…”
Section: Defect Properties and Detector Performancementioning
confidence: 99%
“…As they become incident onto the material, the particles penetrate the material and collide with the semiconductor lattice. The incident particles transfer sufficient energy to the silicon to displace an atom within the lattice out of its normal position such that interstitial atoms and vacancies are generated in the bulk of the material [3]. The result is that the lattice structure of the material changes and this degrades the performance of the devices.…”
Section: Introductionmentioning
confidence: 99%