Comparision of MOSFET Characteristics Between ALD and MOCVD TiN Metal Gate on Hf Silicate

Song, Seung-Chul; Lee, B.H.; Zhang, Z.; Choi, Kwang-Il; Bae, S.H.; Alshareef, Husam N.; Majhi, P.; Wen, Huang-Chun; Bennett, Joe; Sassman, B.; Zeitzoff, P.

doi:10.1149/ma2005-01/15/724

Meet. Abstr.

2006

DOI: 10.1149/ma2005-01/15/724

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Comparision of MOSFET Characteristics Between ALD and MOCVD TiN Metal Gate on Hf Silicate

Seung-Chul Song¹,

B.H. Lee²,

Z. Zhang

et al.

Abstract: not Available.

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Comparision of MOSFET Characteristics Between ALD and MOCVD TiN Metal Gate on Hf Silicate

Abstract: not Available.

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See others like this or search for similar articles

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