Compact laser plasma EUV source based on a gas puff target for metrology applications

Fiedorowicz, Henryk; Bartnik, A.; Jarocki, R.; Kostecki, J.; Krzywiński, J.; Mikołajczyk, J.; Rakowski, Rafał; Szczurek, Anna; Szczurek, M.

doi:10.1016/j.jallcom.2005.02.069

Cited by 70 publications

(36 citation statements)

References 8 publications

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“…To tune the gas density, the time delays for the xenon gas and the outer gas were varied. It was found experimentally that, due to an opacity effect produced by surrounding neutral and lowionized Xe ions, the maximum gas density measured for the delay t Xe,H or He = 800 µs was not optimal for the most efficient generation of EUV radiation [15]. It was found that for the delay t Xe = 800 µs, the optimum time delay for the auxiliary gas (either H or He) was t H,He = 350 µs [32].…”

Section: Measurements With the Grazing Incidence Spectrographmentioning

confidence: 99%

“…For the f = 25 mm lens the maximum intensity of the EUV source is about 8 mJ/2π [15]. In order to estimate the inband conversion efficiency at 2% BW, the calibrated EUV energy meter E-MON was employed, indicating a value of 0.42% for the f = 50 mm lens.…”

Section: Measurements With the Axuv-100si/zr Photodiodementioning

confidence: 99%

“…Nevertheless, much work remains to be done in this field. It was demonstrated that a LPP source utilizing noble gas, for instance xenon, is a debris-free, to some extent point-like EUV and soft X-ray source [14,15].…”

Section: Introductionmentioning

confidence: 99%

“…The double-stream gas-puff target is formed by the injection of gas under high pressure through the nozzles of an electromagnetic valve system driven synchronously by the laser power supply. The valve system is described elsewhere [15]. Xenon is the driver gas which flows through a cylindrical orifice into a hollow stream of an outer gashelium injected by an annular orifice in a concentric manner with the cylindrical one [18].…”

Section: Introductionmentioning

confidence: 99%

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Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

et al. 2010

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The paper describes a debris-free, efficient laserproduced plasma source emitting EUV radiation. The source is based on a double-stream Xe/He gas-puff. Its properties and spectroscopic signatures are characterized and discussed. The spatio-spectral features of the EUV emission are investigated. We show a large body of results related to the intensity and brightness of the EUV emission, its spatial, temporal, and angular behavior and the effect of the repetition rate as well. A conversion efficiency of laser energy into EUV in-band energy at 13.5 nm of 0.42% has been gained. The electron temperature and electron density of the source were estimated by means of a novel method using the FLY code. The experimental data and the Hullac code calculations are compared and discussed. The source is well suited for EUV metrology purposes. The potential of the source for R. Rakowski ( ) ·

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Section: Measurements With the Grazing Incidence Spectrographmentioning

confidence: 99%

Section: Measurements With the Axuv-100si/zr Photodiodementioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

Section: Introductionmentioning

confidence: 99%

See 2 more Smart Citations

Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

et al. 2010

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“…1a. An Nd:YAG laser pulse (NL302, Eksma), λ = 1064 nm, 500 mJ/4 ns, is focused using a lens onto a double-stream Ar/He gas-puff target [23,24], produced by an electromagnetic double-nozzle valve [25] resulting in formation of a plasma. The optimum Ar/He pressure for efficient EUV emission from such plasma was found to be 10 and 6 bar, respectively.…”

Section: Euv Microscope Constructionmentioning

confidence: 99%

A desktop extreme ultraviolet microscope based on a compact laser-plasma light source

et al. 2016

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research, such as mask inspection [6,7]-reaching 22-nm half pitch resolution or lithography [8], as well as free electron lasers [9] for coherent diffraction imaging (CDI) schemes [10]. These facilities, although state of the art and dedicated to cutting-edge science experiments, are not "user friendly," with limited user access and require high maintenance costs, because of their scale and complexity. Another approach is to use tabletop high-order harmonic (HHG) sources [11] for sub-100-nm spatial resolution imaging [12]; however, typical 10 −6 -10 −5 HHG conversion efficiency is very low and often does not allow for a proper reconstruction [13], the system is very complicated, and typical CDI requires time-consuming numerical data processing. Ptychographic schemes, although providing very high spatial resolution, are serial in nature, extensively time-consuming and computationally demanding.To partially overcome these limitations, other compact EUV sources, such as discharge [14], Z-pinch [15] or laserproduced plasma sources [16], coupled to zone plates or Schwarzschild mirrors, were used. The first one is compact and shows very good spatial resolution, but requires often (~30 k pulses) capillary replacements, the second one demonstrates quite low performance in terms of spatial resolution and field of view exploiting inadequate mode of imaging for lithographic mask inspection, while the last one requires debris mitigation schemes.The use of compact, short-wavelength sources often does not allow for high signal-to-noise ratio image acquisition. An example of that are recent developments in soft X-ray (SXR) microscopy in so-called water window, such as a compact soft X-ray microscope based on a single nitrogen gas jet, capable of resolving features ~100 nm later improved to ~50 nm in size providing high spatial resolution; however, the exposure time for Siemens star test pattern was equal to 1-2 h, limiting the usability of Abstract A compact, desktop size microscope, based on laser-plasma source and equipped with reflective condenser and diffractive Fresnel zone plate objective, operating in the extreme ultraviolet (EUV) region at the wavelength of 13.8 nm, was developed. The microscope is capable of capturing magnified images of objects with 95-nm full-pitch spatial resolution (48 nm 25-75% KE) and exposure time as low as a few seconds, combining reasonable acquisition conditions with stand-alone desktop footprint. Such EUV microscope can be regarded as a complementary imaging tool to already existing, well-established ones. Details about the microscope, characterization, resolution estimation and real sample images are presented and discussed.

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Imaging in Nanoscale Using Laser-Plasma Sources of Extreme Ultraviolet (EUV)

Wachulak

Bartnik

Baranowska‐Korczyc

et al. 2014

Springer Proceedings in Physics

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Compact laser plasma EUV source based on a gas puff target for metrology applications

Cited by 70 publications

References 8 publications

Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

Characterization and optimization of the laser-produced plasma EUV source at 13.5 nm based on a double-stream Xe/He gas puff target

A desktop extreme ultraviolet microscope based on a compact laser-plasma light source

Imaging in Nanoscale Using Laser-Plasma Sources of Extreme Ultraviolet (EUV)

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