“…The bottom-up approach, based on molecular self-assembly that can utilize molecular-level buildingb locks for nanometerscale pattern formation, has been highlighted as ap romising candidate for next-generation nanopatterning technology due to the easy and cost-effective accessibility to sub-10 nm scale dimensions. [1][2][3][4] Furthermore, even three-dimensionally defined, complex nanostructures can be easily prepared by molecular self-assembly without any expensive additional devices.I np articular,s elf-assembled systemso fm acromolecules have been of great interest, includingb iopolymers, [5] reactive blends, [6][7][8][9] and block copolymers, [10][11][12][13][14] among which block copolymers have been widely utilizedt of abricatet ens-of-nanometer-scale nanopatterns during the last few decades. Thermodynamically incompatible polymers of ab lock copolymerr epel each other and undergo microphase segregation due to covalentl inks between the polymers,g iving rise to nanoscale ordered struc-tures.Bycontrolling the ratio of each block and their molecular weights, avariety of spatially periodict wo-or three-dimensional nanostructures, such as spheres, cylinders, gyroids, and lamellas, can be achieved.…”