2004
DOI: 10.1016/j.jcrysgro.2004.03.057
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Co-doping carbon tetrabromide (CBr4) and antimony (Sb) on GaAs [100] in solid source molecular beam epitaxy

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Cited by 2 publications
(1 citation statement)
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“…At higher doping levels, the sheet resistance tends to saturate due to the decrease of mobility. It has been previously shown that carrier concentration and mobility strongly depend on the growth parameters such as growth temperature, V/III flux ratio and growth rate [8,9]. We have then studied the influence of the growth temperature on the transport properties of GaAsSb.…”
Section: Resultsmentioning
confidence: 99%
“…At higher doping levels, the sheet resistance tends to saturate due to the decrease of mobility. It has been previously shown that carrier concentration and mobility strongly depend on the growth parameters such as growth temperature, V/III flux ratio and growth rate [8,9]. We have then studied the influence of the growth temperature on the transport properties of GaAsSb.…”
Section: Resultsmentioning
confidence: 99%