TRANSDUCERS 2009 - 2009 International Solid-State Sensors, Actuators and Microsystems Conference 2009
DOI: 10.1109/sensor.2009.5285878
|View full text |Cite
|
Sign up to set email alerts
|

CMUT-in-CMOS ultrasonic transducer arrays with on-chip electronics

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
8
0

Year Published

2011
2011
2021
2021

Publication Types

Select...
5
1
1

Relationship

0
7

Authors

Journals

citations
Cited by 16 publications
(8 citation statements)
references
References 5 publications
0
8
0
Order By: Relevance
“…This post-processing is kept minimal in a process called ‘CMUT-in-CMOS’ by augmenting a standard foundry process only with two blanket post-process steps for sacrificial etching and cavity sealing [Cheng09]. Although this process is fairly simple, it still suffers from the limitations on the device dimensions in the vertical direction because layers available in the standard foundry process are utilized as sacrificial layer.…”
Section: Integration With Electronic Circuitsmentioning
confidence: 99%
“…This post-processing is kept minimal in a process called ‘CMUT-in-CMOS’ by augmenting a standard foundry process only with two blanket post-process steps for sacrificial etching and cavity sealing [Cheng09]. Although this process is fairly simple, it still suffers from the limitations on the device dimensions in the vertical direction because layers available in the standard foundry process are utilized as sacrificial layer.…”
Section: Integration With Electronic Circuitsmentioning
confidence: 99%
“…Remaining structure is then e, silicon oxide and polysilicon layers [2]. In other approach, keeping metal layers for a device design, a sacrificial silicon oxide can be removed with saturated with aluminum (SiloxVapox) MEMS fabrication cost maskless etching and a potential to integrate a MEMS device with electronics on the Acoustic devices as microphones [3][4][5] or CMUTs machined ultrasonic transducers) [6,7], have CMOS approaches that require like material deposition to build the entire ost of microphone designs consist of a agm and a perforated backplate backplate, there is chamber that makes the air evacuation from the air gap chamber is usually obtained by back side have studied and developed a model of a condenser microphone with a different approach that does not require backside bulk micromachining. Our microphone structure is similar to conventional MEMS microphone but the movable diaphragm is perforated with small holes to allow SiO 2 etching as well as microphone ventilation.…”
Section: Mems Technology Acoustic Mems Front-mentioning
confidence: 99%
“…Acoustic devices as microphones [3 (capacitive micro-machined ultrasonic transducers) [6,7], have been fabricated using post-CMOS approaches some supplementary technology steps, like material deposition [3,6,7] or backside substrate etch [4,5], to build the entire MEMS structure. Most of microphone design sealed movable diaphragm and a perforated backplate separated by an air gap (Fig.…”
Section: Introductionmentioning
confidence: 99%
“…Processing of the CMUTs can be simultaneously accomplished with the fabrication of electronics utilizing reliable and well-established CMOS processing techniques [11]. Due to the parallel processing, the overall fabrication time and processing costs are reduced.…”
Section: Cmut-cmos Integration Techniquesmentioning
confidence: 99%