Cluster SIMS using metal cluster complex ions

Fujiwara, Yukio; Kondou, Kouji; Teranishi, Yutaka; Watanabe, Kouji; Nonaka, Hidehiko; Saito, Naoaki; Itoh, Hiroshi; Fujimoto, Toshiyuki; Kurokawa, Akira; Ichimura, Shingo; Tomita, Mitsuhiro

doi:10.1016/j.apsusc.2008.05.105

Cited by 6 publications

(4 citation statements)

References 38 publications

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“…Much effort has recently been devoted to alleviate these issues, for example, via sample cooling , or the use of a grazing incidence angle . On the other hand, there has been a recent increase in studies devoted to novel cluster ion sources, including C 24 H 12 + and C 80 + , Ir 4 (CO) 7 + , Au 400 4+ , and Ar 1500 + . There is a general consensus in the community that the optimal choice of primary ion for organic depth profiling is complex and dependent on the sample under study. ,− It is likely that different primary ion beams would be optimal for different applications.…”

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confidence: 99%

Organic Depth Profiling of a Nanostructured Delta Layer Reference Material Using Large Argon Cluster Ions

et al. 2009

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Cluster ion beams have revolutionized the analysis of organic surfaces in time-of-flight secondary ion mass spectrometry and opened up new capabilities for organic depth profiling. Much effort has been devoted to understanding the capabilities and improving the performance of SF(5)(+) and C(60)(n+), which are successful for many, but not all, organic materials. Here, we explore the potential of organic depth profiling using novel argon cluster ions, Ar(500)(+) to Ar(1000)(+). We present results for an organic delta layer reference sample, consisting of ultrathin "delta" layers of Irganox 3114 (approximately 2.4 nm) embedded between thick layers of Irganox 1010 (approximately 46 or 91 nm). This indicates that, for the reference material, major benefits can be obtained with Ar cluster ions, including a constant high sputtering yield throughout a depth of approximately 390 nm, and an extremely low sputter-induced roughness of <5 nm. Although the depth resolution is currently limited by an instrumental artifact, and may not be the best attainable, these initial results strongly indicate the potential to achieve high depth resolution and suggest that Ar cluster ions may have a major role to play in the depth profiling of organic materials.

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confidence: 99%

Organic Depth Profiling of a Nanostructured Delta Layer Reference Material Using Large Argon Cluster Ions

et al. 2009

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“…59 -63,82 These sources are comprised of chemically synthesized organometallic compounds, which consist of a metallic framework of several metal atoms and surrounding ligands. 62 These clusters have much higher molecular weights as compared to more conventional cluster beams such as C 60 and SF 5 + , and are therefore expected to be much more useful for analysis of inorganic materials (see Chapter 2 for a discussion on the importance of mass matching). Thus far, the metal cluster complex ion beam has been shown to significantly improve depth resolutions for inorganic depth profiling applications over more conventional approaches (e.g., O 2 depth profiling).…”

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confidence: 99%

Surface Analysis of Organic Materials with Polyatomic Primary Ion Sources

Mahoney

2013

Cluster Secondary Ion Mass Spectrometry

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“…Therefore, many kinds of analytical equipment are used in order to monitor the amount of impurities and maintain the quality of devices. For example, X-ray photoelectron spectroscopy (XPS) [1], secondary ionization mass spectroscopy (SIMS) [2], and electron probe micro analysis (EPMA) [3] are very useful for detecting trace amounts of inorganic impurities. However, detection and identification of the organic impurities on a silicon wafer are still difficult.…”

Section: Introductionmentioning

confidence: 99%