Mass spectrometric study of photo dissociation of organic molecules by vacuum-ultraviolet irradiation for development of analysis technique

Wasamoto, Makoto; Katto, Masahito; Kaku, Masanori; Kubodera, Shoichi; Yokotani, Atsushi

doi:10.1016/j.apsusc.2009.04.107

Cited by 12 publications

(4 citation statements)

References 6 publications

(6 reference statements)

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In the near future, we plan to develop a compact potassium plasma EUV source, coupled with a Sc/Si multilayer mirror for use in a photoinduced desorption spectrometer. 25,26 A part of this work was performed under "Project for Bio-Imaging and Sensing at Utsunomiya University" from MEXT. The UCD group was supported by Science Foundation Ireland International Co-operation Strategic Award 13/ISCA/2846.…”

mentioning

confidence: 99%

Note: Enhancement of the extreme ultraviolet emission from a potassium plasma by dual laser irradiation

Higashiguchi

Yamaguchi

Ôtsuka

et al. 2014

Review of Scientific Instruments

View full text Add to dashboard Cite

Emission spectra from multiply charged potassium ions ranging from K(3+) to K(5+) have been obtained in the extreme ultraviolet (EUV) spectral region. A strong emission feature peaking around 38 nm, corresponding to a photon energy of 32.6 eV, is the dominant spectral feature at time-averaged electron temperatures in the range of 8-12 eV. The variation of this emission with laser intensity and the effects of pre-pulses on the relative conversion efficiency (CE) have been explored experimentally and indicate that an enhancement of about 30% in EUV CE is readily attainable.

show abstract

mentioning

confidence: 99%

Note: Enhancement of the extreme ultraviolet emission from a potassium plasma by dual laser irradiation

Higashiguchi

Yamaguchi

Ôtsuka

et al. 2014

Review of Scientific Instruments

View full text Add to dashboard Cite

show abstract

“…Short wavelengths are generally necessary for surface material processing. [1][2][3] Light sources in these spectral regions will thus be applied in various scientific and engineering fields, such as semiconductor lithography, 4-6 diagnostics in dense plasmas, materials processing, photochemistry, biological imaging, and so on. Recently, a desorption spectrometer employing a compact, efficient discharge-produced microplasma extreme ultraviolet ͑XUV͒ source in the 20-100 nm broadband spectral region has been proposed, which has the advantage of neither damaging or melting the surface after irradiation.…”

Section: Introductionmentioning

confidence: 99%

Microdischarge extreme ultraviolet source with alkali metal vapor for surface morphology application

Higashiguchi

Terauchi

Ôtsuka

et al. 2011

Journal of Applied Physics

View full text Add to dashboard Cite

We have characterized a discharge-produced potassium plasma extreme ultraviolet (XUV) source. Potassium ions produced strong broadband emission around 40 nm with a bandwidth of 8 nm (full width at half-maximum). By comparison with atomic structure calculations, the broadband emission is found to be primarily due to 3d–3p transitions in potassium ions ranging from K2+ to K4+. The current-voltage characteristics of the microdischarge suggest that the source operates in a hollow cathode mode and consequently the emitting ions may be localized on the potassium electrode surface at the hole into the capillary. To understand the spectral behavior from the potassium plasmas we compared the spectra from the discharge-produced plasma with that from a laser-produced plasma. The spectra from the different (electric and laser) plasmas at the same electron temperature (12 eV) were almost the same. This compact capillary XUV source with a photon energy of 30 eV is a useful XUV emission source for surface morphology applications.

show abstract

“…This is a broader range than the applications described above, but the penetration length in materials is extremely short, only a few nanometers, and the photon energy (6 eV to 30 eV) is capable of breaking the bonds of most compounds. By taking advantage of these features, applications to surface spectroscopy of materials using photodesorption induced by extreme ultraviolet or vacuum ultraviolet light irradiation can be expected . It has been shown that if a metal with a relatively high atomic number is used as a target, emission spectra covering the range from the extreme ultraviolet to the vacuum ultraviolet can be obtained; among such metals, tungsten has a high luminescent intensity .…”

Section: Introductionmentioning

confidence: 99%

Enhancement of Extreme Ultraviolet Emission Intensity from a Laser‐Produced Plasma Using an Alloy Target

Kaku

Matsuura

Kubodera

2014

Elect Comm in Japan

View full text Add to dashboard Cite

show abstract

Mass spectrometric study of photo dissociation of organic molecules by vacuum-ultraviolet irradiation for development of analysis technique

Cited by 12 publications

References 6 publications

Note: Enhancement of the extreme ultraviolet emission from a potassium plasma by dual laser irradiation

Note: Enhancement of the extreme ultraviolet emission from a potassium plasma by dual laser irradiation

Microdischarge extreme ultraviolet source with alkali metal vapor for surface morphology application

Enhancement of Extreme Ultraviolet Emission Intensity from a Laser‐Produced Plasma Using an Alloy Target

Contact Info

Product

Resources

About