“…Moreover, if effusion of hydrogen from the stack was the main cause for the loss of passivation, the different onset temperatures at which the passivation starts to decrease that is observed for the different interfacial oxides would not be expected, provided the passivation level of the various oxides reacts similarly to dehydrogenation. Finally, it has been shown in studies on poly-Si(n)/ZnO:Al structures that ZnO can reduce to metallic Zn at temperatures exceeding 600 o C, especially in the presence of hydrogen, and that this Zn can moreover diffuse into the silicon forming recombination centers [59,60]. Although the loss of passivation in this work is observed at somewhat lower temperatures, such a mechanism cannot be excluded.…”