A novel ultra-high vacuum instrument for X-ray reflectometry and spectrometry-related techniques for nanoanalytics by means of synchrotron radiation has been constructed and commissioned. This versatile instrument was developed by the Physikalisch-Technische Bundesanstalt, Germany's national metrology institute, and includes a 9-axis manipulator that allows for an independent alignment of the samples with respect to all degrees of freedom. In addition, a rotational and translational movement of several photodiodes as well as a translational movement of an aperture system in and out of the beam is provided. Thus, the new instrument enables various analytical techniques based on energy dispersive X-ray detectors such as reference-free X-ray fluorescence analysis (XRF), total-reflection XRF, grazing-incidence XRF in addition to optional X-ray reflectometry measurements or polarization-dependent X-ray absorption fine structure analyses. With this instrument samples having a size of up to 100 mm × 100 mm can be analyzed with respect to their mass deposition, elemental or spatial composition, or the species in order to probe surface contamination, layer composition and thickness, the depth profile of matrix elements or implants, the species of nanolayers, nanoparticles or buried interfaces as well as the molecular orientation of bonds. Selected applications of this advanced ultra-high vacuum instrument demonstrate both its flexibility and capability.

The knowledge of atomic fundamental parameters such as mass attenuation coecients with low uncertainties, is of decisive importance in elemental quantication using X-ray uorescence analysis techniques. Several databases are accessible and frequently used within a large community of users. These compilations are most often in good agreement for photon energies in the hard X-ray ranges. However, they signicantly dier for low photon energies and around the absorption edges of any element. In a joint cooperation of the metrology institutes of France and Germany, mass attenuation coecients of copper and zinc were determined experimentally in the photon energy range from 100 eV to 30 keV by independent approaches using monochromatized synchrotron radiation at SOLEIL (France) and BESSY II (Germany), respectively. The application of high-accuracy experimental techniques resulted in mass attenuation coecient datasets determined with low uncertainties that are directly compared to existing databases. The novel datasets are expected to enhance the reliability of mass attenuation coecients.

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The determination of the thickness and elemental composition is an important part of the characterization of nanolayered structures. For buried nanolayers, X-ray fluorescence spectrometry is a qualified method for the thickness determination whereas conventional electron emission based methods may reach their limits due to rather restricted information depths. The aim of the presented investigation was the comparison of reference-free X-ray fluorescence spectrometry under conventional and grazing incidence conditions offering complementary information with respect to quantification reliability, elemental sensitivity, and layer sequences. For this purpose, buried boron-carbon layers with nominal thicknesses of 1, 3, and 5 nm have been studied using monochromatized undulator radiation in the laboratory of the Physikalisch-Technische Bundesanstalt (PTB) at the synchrotron radiation facility BESSY II. The results for the two beam geometries are compared and show particulate good agreements, thus encouraging the complementary use of both methodologies.

Nanolayer stacks are technologically very relevant for current and future applications in many fields of research. A non-destructive characterization of such systems is often performed using X-ray reflectometry (XRR). For complex stacks of multiple layers, low electron density contrast materials or very thin layers without any pronounced angular minima, this requires a full modeling of the XRR data. As such modeling is using the thicknesses, the densities and the roughnesses of each layer as parameters, this approach quickly results in a large number of free parameters. In consquence, cross-correlation effects or interparameter dependencies can falsify the modeling results. Here, we present a route for validation of such modeling results which is based on the reference-free grazing incidence X-ray fluorescence (GIXRF) methodology. In conjunction with the radiometrically calibrated instrumentation of the Physikalisch-Technische Bundesanstalt the method allows for reference-free quantification of the elemental mass depositions. In addition, a modeling approach of reference-free GIXRF-XRR data is presented, which takes advantage of the quantifiable elemental mass depositions by distributing them depth dependently. This approach allows for a reduction of the free model parameters. Both the validation capabilities and the combined reference-free GIXRF-XRR modeling are demonstrated using several nanoscale layer stacks consisting of HfO 2 and Al 2 O 3 layers.