1983
DOI: 10.1109/tns.1983.4333159
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Charge Collection in Test Structures

Abstract: Charge collection processes have been studied as a function of ion type and incident angle of the impinging ion on silicon diffused junction structures on various epitaxial layer thicknesses.

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Cited by 30 publications
(4 citation statements)
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References 14 publications
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“…Silicon drift detectors (SDD), invented in 1984 by , are also proposed for roomtemperature spectroscopic X-ray imaging, representing the best solution up to 20 keV (Bertuccio et al, 2015). Despite their excellent energy resolution and high detection efficiency, few ERPC prototypes based on high-purity germanium (HPGe) detectors have been developed, mainly due to their cumbersome cryogenic cooling (liquid and mechanical coolers) and the difficulties in fabricating small pixel devices (Johnson et al, 2015;Campbell et al, 2013;Krings et al, 2015).…”
Section: Introductionmentioning
confidence: 99%
“…Silicon drift detectors (SDD), invented in 1984 by , are also proposed for roomtemperature spectroscopic X-ray imaging, representing the best solution up to 20 keV (Bertuccio et al, 2015). Despite their excellent energy resolution and high detection efficiency, few ERPC prototypes based on high-purity germanium (HPGe) detectors have been developed, mainly due to their cumbersome cryogenic cooling (liquid and mechanical coolers) and the difficulties in fabricating small pixel devices (Johnson et al, 2015;Campbell et al, 2013;Krings et al, 2015).…”
Section: Introductionmentioning
confidence: 99%
“…Initial charge collection measurements were performed on diffused junction and MOS capacitor structures [1,2,3].…”
Section: Introductionmentioning
confidence: 99%
“…Diffusion effects could be the source of the apparently large collection depths derived from the experimental data. Both experimental [14] and theoretical [ 15,161 work suggest that diffusion processes in epitaxial silicon devices can make a significant contribution to the charge collected at a sensitive node, and that the charge collection depth may be significantly deeper than the epitaxial width. To our knowledge, the extent to which diffusion processes affect the SEU characteristics of the 93L422 has not been directly measured.…”
Section: A Silicon Srammentioning
confidence: 99%