2018
DOI: 10.1038/s41467-018-05453-5
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Charge carrier-selective contacts for nanowire solar cells

Abstract: Charge carrier-selective contacts transform a light-absorbing semiconductor into a photovoltaic device. Current record efficiency solar cells nearly all use advanced heterojunction contacts that simultaneously provide carrier selectivity and contact passivation. One remaining challenge with heterojunction contacts is the tradeoff between better carrier selectivity/contact passivation (thicker layers) and better carrier extraction (thinner layers). Here we demonstrate that the nanowire geometry can remove this … Show more

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Cited by 29 publications
(24 citation statements)
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“…These local accumulations/inversions are caused by a difference in the Fermi level at the interface to establish carrier-selective contacts ( Fig. 3 ) [104] . In PSC devices, the difference between the Fermi level of the HTL and the ETL es-tablishes the built-in potential.…”
Section: Planar Pscs With a Compact Sno 2 Film As Etl Materialsmentioning
confidence: 99%
See 2 more Smart Citations
“…These local accumulations/inversions are caused by a difference in the Fermi level at the interface to establish carrier-selective contacts ( Fig. 3 ) [104] . In PSC devices, the difference between the Fermi level of the HTL and the ETL es-tablishes the built-in potential.…”
Section: Planar Pscs With a Compact Sno 2 Film As Etl Materialsmentioning
confidence: 99%
“…The role of the built-in potential is to separate the photon-generated electron and hole, which facilitates them to drift to the ETL and HTL, respectively. Once a suitable ETL material is found, it often has to be thin to reduce the resistance and absorption losses [104] . To achieve high-performance PSC devices, a uniform and thin SnO 2 film with low density of defects and pinhole-free is essential.…”
Section: Planar Pscs With a Compact Sno 2 Film As Etl Materialsmentioning
confidence: 99%
See 1 more Smart Citation
“…In Figures 6(a) and 6(b), several different cleaning solutions are thus evaluated by measuring the integrated intensity of PL emission of intrinsic nanowires. SiO 2 deposited by PECVD at 300°C is used as passivation, as it has been demonstrated to be effective in several instances both for InP and for other III − V materials [15,16,18,49]. The use of SiO 2 only, without any cleaning beforehand, appears to be detrimental compared to the as-grown sample, most likely because without any cleaning the native oxide formed on the nanowire sidewalls prevents any effective passivation of the material.…”
Section: Effect Of Device Processingmentioning
confidence: 99%
“…They have been extensively studied in the last 10 years, with extremely promising results in lasing, transistor, and solar cell applications [12][13][14]. In particular, selective area InP nanowires have demonstrated very good PV device performance when measured in a single nanowire geometry [15,16].…”
Section: Introductionmentioning
confidence: 99%