Silicon crystallized in the usual cubic (diamond) lattice structure has dominated the electronics industry for more than half a century. However, cubic silicon (Si), germanium (Ge) and SiGe-alloys are all indirect bandgap semiconductors that cannot emit light efficiently. Accordingly, achieving efficient light emission from group-IV materials has been a holy grail 1 in silicon technology for decades and, despite tremendous efforts 2-5 , it has remained elusive 6 . Here, we demonstrate efficient light emission from direct bandgap hexagonal Ge and SiGe alloys. We measure a sub nanosecond, temperature insensitive radiative recombination lifetime and observe a similar emission yield to direct bandgap III-V semiconductors. Moreover, we demonstrate how by controlling the composition of the hexagonal SiGe alloy, the emission wavelength can be continuously tuned in a broad range, while preserving a direct bandgap. Our experimental findings are shown to be in excellent quantitative agreement with the ab initio theory. Hexagonal SiGe embodies an ideal material system to fully unite electronic and optoelectronic functionalities on a single chip, opening the way towards novel device concepts and information processing technologies.Silicon has been the workhorse of the semiconductor industry since it has many highly advantageous physical, electronic and technological properties. However, due to its indirect bandgap, silicon cannot emit light efficientlya property that has seriously constrained potential for applications to electronics and passive optical circuitry 7-9 . Silicon technology can only reach its full application potential when heterogeneously supplemented 10 with an efficient, direct bandgap light emitter.The band structure of cubic Si, presented in Fig. 1a is very well known, having the lowest conduction band (CB) minimum close to the X-point and a second lowest * These authors contributed equally to this work. † Correspondence to E.P.A.M.(e.p.a.m.bakkers@tue.nl).minimum at the L-point.As such, it is the archetypal example of an indirect bandgap semiconductor, that, notwithstanding many great efforts 3-6 , cannot be used for efficient light emission.By modifying the crystal structure from cubic to hexagonal, the symmetry along the 111 crystal direction changes fundamentally, with the consequence that the L-point bands are folded back onto the Γ-point. As shown in Fig. 1b, for hexagonal Si (Hex-Si) this results in a local CB minimum at the Γ-point, with an energy close to 1.7 eV 11-13 . Clearly, Hex-Si remains indirect since the lowest energy CB minimum is at the M-point, close to 1.1 eV. Cubic Ge also has an indirect bandgap but, unlike Si, the lowest CB minimum is situated at the L-point, as shown in Fig. 1c. As a consequence, for Hex-Ge the band folding effect results in a direct bandgap at the Γ-point with a magnitude close to 0.3 eV, as shown in the calculated band structure in Fig. 1d 14 .To investigate how the direct bandgap energy can be tuned by alloying Ge with Si, we calculated the band structures of He...

Photovoltaic cells based on arrays of semiconductor nanowires promise efficiencies comparable or even better than their planar counterparts with much less material. One reason for the high efficiencies is their large absorption cross section, but until recently the photocurrent has been limited to less than 70% of the theoretical maximum. Here we enhance the absorption in indium phosphide (InP) nanowire solar cells by employing broadband forward scattering of self-aligned nanoparticles on top of the transparent top contact layer. This results in a nanowire solar cell with a photovoltaic conversion efficiency of 17.8% and a short-circuit current of 29.3 mA/cm under 1 sun illumination, which is the highest reported so far for nanowire solar cells and among the highest reported for III-V solar cells. We also measure the angle-dependent photocurrent, using time-reversed Fourier microscopy, and demonstrate a broadband and omnidirectional absorption enhancement for unpolarized light up to 60° with a wavelength average of 12% due to Mie scattering. These results unambiguously demonstrate the potential of semiconductor nanowires as nanostructures for the next generation of photovoltaic devices.

Group IV semiconductor optoelectronic devices are now possible by using strain-free direct band gap GeSn alloys grown on a Ge/Si virtual substrate with Sn contents above 9%. Here, we demonstrate the growth of Ge/GeSn core/shell nanowire arrays with Sn incorporation up to 13% and without the formation of Sn clusters. The nanowire geometry promotes strain relaxation in the GeSn shell and limits the formation of structural defects. This results in room-temperature photoluminescence centered at 0.465 eV and enhanced absorption above 98%. Therefore, direct band gap GeSn grown in a nanowire geometry holds promise as a low-cost and high-efficiency material for photodetectors operating in the short-wave infrared and thermal imaging devices.

We experimentally observed an oscillating carrier capture time as a function of quantum well thickness. The capture times were obtained in a separate confinement quantum well structure by subpicosecond rise time measurements of the quantum well luminescence as well as by pump-probe correlation measurements of the population decay in the barrier layer. Both experimental techniques yield an oscillating capture time between 3 and 20 ps, in excellent agreement with the theoretical predictions. In a classical picture, our results correspond to a local capture time oscillating between 0.1 and 1.8 ps. Furthermore, the dependence of the capture time on the excitation energy is analyzed and the timedependent position of the quasi-Fermi-level in the barrier layer is tracked experimentally. We find that the carrier capture time is very sensitive to the detailed structure parameters as well as to the carrier distribution in the barrier. Carrier capture is found to be an ambipolar process in which the oscillations of the observed capture times are due to the quantum-mechanical oscillation of the electron wave-function overlap above the well. Finally, electron capture is demonstrated to be dominated by LO-phonon emission.

We have studied the effect of impurity doping on the optical properties of indium phosphide (InP) nanowires. Photoluminescence measurements have been performed on individual nanowires at low temperatures (5–70 K) and at low excitation intensities (0.5–10W∕cm2). We show that the observed redshift (200 meV) and the linewidth (70 meV) of the emission of p-type InP wires are a result of a built-in electric field in the nanowires. This bandbending is induced by Fermi-level pinning at the nanowire surface. Upon increasing the excitation intensity, the typical emission from these p-InP wires blueshifts with 70meV∕decade, due to a reduction of the bandbending induced by an increase in the carrier concentration. For intrinsic and n-type nanowires, we found several impurity-related emission lines.