We report on the thermal resistances of thin films (20 nm) of hafnium zirconium oxide (Hf 1-x Zr x O 2) with compositions ranging from 0 x 1. Measurements were made via timedomain thermoreflectance and analyzed to determine the effective thermal resistance of the films in addition to their associated thermal boundary resistances. We find effective thermal resistances ranging from 28.79 to 24.72 m 2 K GW À1 for amorphous films, which decreased to 15.81 m 2 K GW À1 upon crystallization. Furthermore, we analyze the heat capacity for two compositions, x ¼ 0.5 and x ¼ 0.7, of Hf 1-x Zr x O 2 and find them to be 2.18 6 0.56 and 2.64 6 0.53 MJ m À3 K À1 , respectively.