Characterization of low temperature photo-assisted metal-organic chemical vapor deposited copper films using hexafluoroacetylacetonate copper(I) trimethylvinylsilane as precursor

Wu, You‐Lin; Hsieh, Ming-Hsuan; Hwang, Huey-Liang

doi:10.1016/j.tsf.2004.12.010

Cited by 8 publications

(3 citation statements)

References 13 publications

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“…Copper has been photodeposited in the form of nanoparticles and thin films using UV and visible light excitation from a small number of precursors . The bulk of the research on copper precursors was done on Cu(hfac)(TMVS) (hfac = 1,1,1,5,5,5-hexafluoro-2,4-pentanedionato; TMVS = trimethylsilylethene), − Cu(hfac) 2 , − and Cu(TMHD) 2 . − Other copper precursors that have been studied include Cu(hfac)(COD) (COD = 1,5-cyclooctadiene), Cu(hfac)(MHY) (MHY = 2-methyl-1-hexene-3-yne), Cu(acac) 2 (acac = 2,4-pentanedionato), CuCp(Et 3 P) (Cp = cyclopentadienyl; Et 3 P = triethylphosphine), Cu(tfa) 2 (tfa = 1,1,1-trifluoro-5,5-dimethyl-2,4-hexanedionato), and Cu(baa) 2 (baa = tert -butylacetoacetato) …”

Section: Introductionmentioning

confidence: 99%

Photofragmentation Pathways and Photodeposition of Nanoparticles from a Gas Phase Copper-Containing Precursor

Rutkowski

Zink

2009

Inorg. Chem.

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Pulsed laser excitation of bis(2,2,6,6-tetramethyl-3,5-heptanedionato)copper(II) (Cu(TMHD)(2)) in the gas phase produced neutral gaseous copper atoms and nanoparticulate copper deposits on substrates. Copper atoms were formed by the complete dissociation of the ligands from the metal. Time of flight mass spectrometry and resonance enhanced multiphoton ionization spectroscopy were used to study the details of this reaction and led to the discovery of other gaseous fragments that were produced by incomplete fragmentation of the ligands including monoligated species and coordinated ligand fragments. Laser-assisted chemical vapor deposition resulted in monodispersed nanoparticles under 100 nm in diameter. X-ray photoelectron spectroscopy and energy dispersive analysis of X-rays were used to determine the elemental composition of the deposit. The relationships between the photofragmentation pathways and the deposited particles are discussed.

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Section: Introductionmentioning

confidence: 99%

Photofragmentation Pathways and Photodeposition of Nanoparticles from a Gas Phase Copper-Containing Precursor

Rutkowski

Zink

2009

Inorg. Chem.

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“…Both classical copper (II) complexes and copper (I) compounds are used as precursors (3,4). In a number of works (3,5,6), UV-stimulation is used to decrease the process temperature. The influence of UV radiation on the mechanism and morphology of the deposited copper films was studied in Ref.…”

Section: Introductionmentioning

confidence: 99%

VUV-Stimulated MO CVD Processes of Copper Layer Deposition

Игуменов¹,

Kuchumov²,

Kozlova³

et al. 2009

ECS Trans.

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VUV-stimulated processes of copper layer deposition were investigated. A conventional compound, copper bishexafluoroacetylacetonate, was used as a precursor. Excimer lamps emitting light within the wavelength range 116-172 nm were used as the sources of VUV radiation. The results of quantum-chemical calculations were compared with the electronic spectra of copper bis-hexafluoroacetylacetonate in the gas phase. Calculations were carried out using the quantum chemical method of the density functional theory with Slater type of atomic wave functions (DFT/TZP). Allowed dipole-dipole electron transitions within the wavelength region 100-1200 nm were calculated on the basis of thus determined electronic structure; these transitions were compared with the experimental spectra. Copper deposition processes were investigated under variation of substrate temperature and precursor, process time, presence of reactant gas, spectral characteristics of the excimer lamps. The resulting layers were characterized by means of SEM, ESCA, ellipsometry.

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“…In general, high-power UV beams or lasers are used as activating sources in metal organic chemical vapor deposition (MOCVD). 4) In other cases, they have been applied for annealing materials such as silicon and high-k dielectric film, where k is the dielectric constant. Hatano et al used a pulsed KrF excimer laser ( ¼ 248 nm) to improve both device performance and uniformity by changing the microstructures of silicon films, because pulsed laser crystallization is an efficient technology for obtaining polycrystalline silicon thin film transistors.…”

Section: Introductionmentioning

confidence: 99%

Process Development of Small Form Factor Optical Recording Disk

Cheong¹,

Yoo²

2006

jjap

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PACS. 61.50E -Crystal symmetry: models and space groups, and crystalline systems and classes. PACS. 61.55H -Alloys.Abstract. -We report the observation of an icosahedral structure in a new alloy system: meltspun Als4VI6. In the .as cast. alloys, homogeneous large icosahedral grains with an average diameter of about 2 pm are observed. From high-resolution STEM X-ray analyses the compositional homogeneity in and around the grains is determined. We discuss the structural studies on i(A1-V) in terms of known structures of the related crystalline alloys, and the relevance of a recent <

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Characterization of low temperature photo-assisted metal-organic chemical vapor deposited copper films using hexafluoroacetylacetonate copper(I) trimethylvinylsilane as precursor

Cited by 8 publications

References 13 publications

Photofragmentation Pathways and Photodeposition of Nanoparticles from a Gas Phase Copper-Containing Precursor

Photofragmentation Pathways and Photodeposition of Nanoparticles from a Gas Phase Copper-Containing Precursor

VUV-Stimulated MO CVD Processes of Copper Layer Deposition

Process Development of Small Form Factor Optical Recording Disk

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