Characterization of hard transparent B–C–N–H thin films formed by plasma chemical-vapor deposition at room temperature

Abstract

B–C–N–H thin films were deposited by plasma chemical-vapor deposition with an external capacitively coupled reactor at an rf frequency of 13.56 MHz. The films were formed from a gas mixture of B2H6 (5.25 vol % in N2), methane, and argon or nitrogen as carrier gases. The deposition was carried out at room temperature and without heating the substrate. The films were transparent in the range of 10 000–2000-Å wavelengths. The Knoop microhardnesses were 1825–3324 kg/mm2 and the refractive index was 1.3–1.6. An extensive discussion of the effect of the deposition conditions on both microhardness and film composition is given. In addition, the interrelation between the microhardness and composition is illustrated.

Plasma CVD of B–C–N thin films using triethylboron in argon–nitrogen plasma

“…2). At these deposition conditions, the carbon and oxygen content of these films was found difficult to evaluate due to the very low density of the films and the 36 and BCl 3 -CH 4 -N 2 mixtures (crosses). 37 uncertainties related to surface contamination.…”

“…The stoichiometries of deposited films are summarized in the ternary diagram in Fig. 2 (red filled circles) and with the compositions compared to selected studies using TBBD (open circles), 5 PB (plus signs), 5 N-TEBA (filled squares), 10,11 N-TMBA (stars), 6,35 TMAB (open triangles), 13 36 and BCl 3 -CH 4 -N 2 mixtures (crosses). 37 From XPS spectra in Fig.…”

Plasma CVD of B-C-N Thin Films Using Triethylboron in Argon-Nitrogen Plasma

“…The interaction between total flow and N/Ar ratio is ascribed to a higher dissociation of N2 at higher total flows, given the higher number of collisions with a higher number of molecules. Please do not adjust margins Please do not adjust margins (filled squares) 10,11 , N-TMBA (stars) 6,33 , TMAB (open triangles) 13 , B2H6-CH4-N2 mixtures (open squares) 34 and BCl3-CH4-N2 mixtures (crosses) 35 .…”

“…No correlation between the deposition parameters and the atomic composition of the films could be made. The stoichiometries of deposited films are summarized in the ternary diagram in Fig 2 (red filled circles) and with the compositions compared to selected studies using TBBD (open circles) 5 , PB (plus signs) 5 , N-TEBA (filled squares) 10,11 , N-TMBA (stars) 6,33 , TMAB (open triangles) 13 , B2H6-CH4-N2 mixtures (open squares) 34 and BCl3-CH4-N2 mixtures (crosses) 35 .…”

Compilation on Synthesis, Characterization and Properties of Silicon and Boron Carbonitride Films

“…Amorphous BCN:H films were first prepared by Montasser et al in 1984 by means of RF and microwave plasma-stimulated CVD using the initial gas mixture composed of diborane, ethane (or methane) and nitrogen (or argon) (Montasser et al, 1984(Montasser et al, , 1985(Montasser et al, , 1990. The synthesis of transparent stable films of hydrogenated boron carbonitride B x C y N z :H is described on substrates made of NaCl, Si and glass (at room temperature).…”