1998
DOI: 10.4028/www.scientific.net/msf.264-268.481
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Characterization of Deep Levels in SiC by Photoluminescence Spectroscopy and Mapping

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Cited by 8 publications
(3 citation statements)
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“…The sharper 11700 Å low-infrared peak coming from the semi-insulating substrate is similar to that reported by Tajima. 8 Tajima observed this peak only at a below bandgap excitation, which is not the case in our experiments.…”
Section: Discussioncontrasting
confidence: 60%
“…The sharper 11700 Å low-infrared peak coming from the semi-insulating substrate is similar to that reported by Tajima. 8 Tajima observed this peak only at a below bandgap excitation, which is not the case in our experiments.…”
Section: Discussioncontrasting
confidence: 60%
“…It should be pointed out that the actual spatial resolution of mapping is not limited by the beam size but by the diffusion of photo-excited carriers. Visible excitation is useful for the below band-gap excitation for specific deep-level emission [3]. For whole wafer mapping the laser beam was irradiated sideways on the wafer with a beam size of around 100 µm.…”
Section: Pl Mapping At Room Temperaturementioning
confidence: 99%
“…The PL mapping technique has been used extensively for this purpose in various semiconductors [1,2]. However, its defect recognition capability is not necessarily high enough in SiC wafers [3][4][5] compared with other techniques, such as etching/optical microscopy [6], X-ray topography [7], etc. The purpose of this paper is to demonstrate the effectiveness of our newly-developed room-temperature PL mapping system for practical detection of structural defects.…”
Section: Introductionmentioning
confidence: 99%