Characterization of CNx thin films prepared by close field unbalanced magnetron sputtering

Park, Yong Seob; Myung, Hyun; Han, Jeon G.; Hong, Byungyou

doi:10.1016/j.tsf.2004.07.032

Cited by 15 publications

(6 citation statements)

References 10 publications

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“…Takadoum et al determined [ 15 ] that a CNx coating displayed higher wear resistance than a DLC coating. The same result has been obtained by Park et al [ 16 ] and Camero et al [ 17 ]. The CNx coatings, under deposition conditions with N/Ar ratios of 0.25–0.50, possessed the highest content of sp 3 bonding and exhibited the highest wear resistance of their samples.…”

Section: Introductionsupporting

confidence: 89%

Antibacterial and Tribological Performance of Carbonitride Coatings Doped with W, Ti, Zr, or Cr Deposited on AISI 316L Stainless Steel

Yao

Lai

2017

Materials

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Carbonitride (CNx) coatings have existed for several decades but are not well understood. Related studies have indicated that CNx coatings exhibit behaviors comparable to diamond-like carbon (DLC) coatings. Metal-doped CNx coatings are expected to show superior performance to single CNx coatings. In this study, a CNx coating and a group of CNx coatings with 6 at. % metal doping (W, Ti, Zr, or Cr) were prepared on biograde AISI 316L stainless steel (SS316L) substrates, and they were then characterized and studied for antibacterial and wear performance. The microstructure, constituent phase, nanohardness, adhesion, surface roughness, and contact angle were evaluated. The antimicrobial test used Staphylococcus aureus and followed the Japanese Industrial Standard JIS Z 2801:2010. Finally, the wear behavior was assessed. The results showed that the CNx coating was a composite of amorphous CNx and amorphous C structures. The metal doping caused crystalline metal carbides/nitrides to form in the CNx coatings, which weakened their overall integrity. All the coatings showed antimicrobial ability for the SS316L samples. The CNx-Zr coating, the surface of which had the highest hydrophilicity, produced the best antibacterial performance. However, the CNx-Zr coating showed lower wear resistance than the CNx-W and CNx-Ti coatings. The CNx-Ti coating with a highly hydrophilic surface exhibited the lowest antibacterial ability.

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Section: Introductionsupporting

confidence: 89%

Antibacterial and Tribological Performance of Carbonitride Coatings Doped with W, Ti, Zr, or Cr Deposited on AISI 316L Stainless Steel

Yao

Lai

2017

Materials

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“…Obviously, incorporation of small amounts of carbon changed the present plasma conditions such as nitrogen activity and activation energy; however, it did not seem to change the film nanostructure. 19,20 This effect was further enhanced with increasing C content. There was no amorphous phase in grain boundaries, as evidenced by HR-TEM observation ͓Fig.…”

Section: Discussionmentioning

confidence: 88%

Phase configuration, nanostructure evolution, and mechanical properties of unbalanced magnetron-sputtered Ti-Cx-Ny thin films

Shen

Zhou

et al. 2007

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

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Ionized magnetron sputter deposition of hard nanocomposite TiN/amorphous-silicon nitride filmsTi-C x -N y thin films with different amounts of C incorporated into TiN 0.87 were deposited on Si͑100͒ substrates at 500°C by reactive unbalanced dc magnetron sputtering. Their phase configuration, nanostructure, and mechanical behavior were investigated by x-ray diffraction ͑XRD͒, x-ray photoelectron spectroscopy ͑XPS͒, high-resolution transmission electron microscopy ͑HRTEM͒, and microindentation measurements. The results indicated that the atomic ratio of ͑C+N͒ / Ti played a crucial role in phase configuration, nanostructure evolution, and mechanical behavior. When the ratio was less than one, a nanocrystalline ͑nc-͒ Ti͑C,N͒ solid solution was formed by dissolution of C into the TiN lattice. Both microhardness and residual compressive stress values increased with an increase of C content. When the C reached saturation, precipitation of small amounts of sp 2 amorphous ͑a-͒ phase appeared with more C incorporation. Further increase of C content ͑up to ϳ19 at. % C͒ made the amorphous phase fully wet nanocrystallites, which resulted in the formation of nanocomposite thin films of ϳ5 nm nc-Ti͑C,N͒ nanocrystallites separated by an ϳ0.5 nm amorphous phase comprised mainly of sp 2 disordered C, graphite, and minor CN x . Thicker amorphous matrices and smaller sized grains followed when C content was further increased. The formation of nanocomposite structure greatly decreased both hardness and residual stress values of thin films. A hardness maximum was believed to be obtained at nc-Ti͑C,N͒ solid solution containing the maximum C amount. Enhancement of the hardness value was attributed to solid solution effect and high residual stress value.

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“…However, incorporation of N in sp 3 -rich C strongly promotes a transformation of the C to sp 2 . 14) Since the correlation between working pressure and nitrogen concentration is still ambiguous, even though the increase in nitrogen content as the deposition pressure is raised has already been observed in magnetron sputtering, 15) we report our results on the effect of C x N y molecular species on carbon nitride thin films as the deposition pressure changes.…”

Section: Introductionmentioning

confidence: 89%

Effect of C_xN_y Molecular Species on Carbon Nitride Thin Films Deposited by Radio Frequency Magnetron Sputtering

Roh

Choi

et al. 2008

jjap

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Carbon nitride films were deposited on Si(100) substrates by radio frequency (RF) magnetron sputtering at different working pressures and gas ratios. The effect of the gas pressure on the molecular structure of the carbon nitride films and C x N y molecular behavior has been discussed. A quadrupole mass spectrometer (QMS) was fitted with a chamber to investigate C x N y molecular species in the gas phase. The composition and bonding were analyzed by Fourier transform infrared spectroscopy (FTIR) and X-ray photoelectron spectroscopy (XPS). An increase in film growth rate was observed with increasing working pressure and nitrogen proportion in the sputtering gas. However, the film growth rate decreased when the working pressures were over $10 mTorr. The N/C ratios in the CN x film were in the range of 0.52 -0.67 and increased with working pressure. The XPS and FTIR spectra confirmed that a decrease in working pressure resulted in an increase in the number of sp 3 C-N bonds. It may be concluded that the decrease in C 2 N molecules containing a high proportion of carbon and the increase in CN 2 containing a high proportion of nitrogen due to the increase in working pressure affected N incorporation in the films.

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Characterization of CNx thin films prepared by close field unbalanced magnetron sputtering

Cited by 15 publications

References 10 publications

Antibacterial and Tribological Performance of Carbonitride Coatings Doped with W, Ti, Zr, or Cr Deposited on AISI 316L Stainless Steel

Antibacterial and Tribological Performance of Carbonitride Coatings Doped with W, Ti, Zr, or Cr Deposited on AISI 316L Stainless Steel

Phase configuration, nanostructure evolution, and mechanical properties of unbalanced magnetron-sputtered Ti-Cx-Ny thin films

Effect of C_xN_y Molecular Species on Carbon Nitride Thin Films Deposited by Radio Frequency Magnetron Sputtering

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Characterization of CNx thin films prepared by close field unbalanced magnetron sputtering

Cited by 15 publications

References 10 publications

Antibacterial and Tribological Performance of Carbonitride Coatings Doped with W, Ti, Zr, or Cr Deposited on AISI 316L Stainless Steel

Antibacterial and Tribological Performance of Carbonitride Coatings Doped with W, Ti, Zr, or Cr Deposited on AISI 316L Stainless Steel

Phase configuration, nanostructure evolution, and mechanical properties of unbalanced magnetron-sputtered Ti-Cx-Ny thin films

Effect of CxNy Molecular Species on Carbon Nitride Thin Films Deposited by Radio Frequency Magnetron Sputtering

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Effect of C_xN_y Molecular Species on Carbon Nitride Thin Films Deposited by Radio Frequency Magnetron Sputtering