Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma

Ji, Su‐Hyeon; Jang, Woo‐Sung; Son, J. N.; Kim, Do‐Heyoung

doi:10.1007/s11814-018-0179-5

Cited by 10 publications

(8 citation statements)

References 23 publications

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“…Even after 200 ALD NiO cycles, the electrode still maintained basic nanowire-like nanostructures due to the conformal deposition in the ALD technique, as well as maintained its macroscopic nature without blocking the macropores, as shown in Fig. 2 c, d [ 28 – 30 ]. TEM analysis for the NiO/CuO/Cu electrode is presented in Fig.…”

Section: Resultsmentioning

confidence: 99%

Dendritic Nanostructured Waste Copper Wires for High-Energy Alkaline Battery

et al. 2019

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HIGHLIGHTS • Electronic waste Cu wires were successfully used as a cost-effective current collector for high-energy wire-type rechargeable alkaline batteries. • The scalable approach was applied to reduce, reuse, and recycle electronic waste. • A developed wire-type rechargeable alkaline battery exhibited a high-energy-density of 82.42 Wh kg −1 with long-term cycling stability. ABSTRACT Rechargeable alkaline batteries (RABs) have received remarkable attention in the past decade for their high energy, low cost, safe operation, facile manufacture, and ecofriendly nature. To date, expensive electrode materials and current collectors were predominantly applied for RABs, which have limited their real-world efficacy. In the present work, we propose a scalable process to utilize electronic waste (e-waste) Cu wires as a cost-effective current collector for high-energy wire-type RABs. Initially, the vertically aligned CuO nanowires were prepared over the waste Cu wires via in situ alkaline corrosion. Then, both atomiclayer-deposited NiO and NiCo-hydroxide were applied to the CuO nanowires to form a uniform dendritic-structured NiCo-hydroxide/ NiO/CuO/Cu electrode. When the prepared dendritic-structured electrode was applied to the RAB, it showed excellent electrochemical features, namely high-energy-density (82.42 Wh kg −1), excellent specific capacity (219 mAh g −1), and long-term cycling stability (94% capacity retention over 5000 cycles). The presented approach and material meet the requirements of a cost-effective, abundant, and highly efficient electrode for advanced eco-friendly RABs. More importantly, the present method provides an efficient path to recycle e-waste for value-added energy storage applications.

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Section: Resultsmentioning

confidence: 99%

Dendritic Nanostructured Waste Copper Wires for High-Energy Alkaline Battery

et al. 2019

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“…However, nickel deficiency (with Ni/O ratio on the order of 0.7‐0.9) in the films grown using cyclopentadienyl complexes has been also reported at lower deposition temperatures 39,73 . Interestingly, later also Ni‐rich films have been proposed by using cyclopentadienyl and ethylcyclopentadienyl nickel and oxygen plasma 28,74 . Ji et al presented XPS results of films grown with Ni(EtCp) 2 at temperatures of 100°C to 325°C with Ni/O ratio of 1.1 to 1.14 74 .…”

Section: Chemical Deposition Of Nickel Oxide Thin Filmsmentioning

confidence: 97%

“…39,73 Interestingly, later also Ni-rich films have been proposed by using cyclopentadienyl and ethylcyclopentadienyl nickel and oxygen plasma. 28,74 Ji et al presented XPS results of films grown with Ni(EtCp) 2 at temperatures of 100 C to 325 C with Ni/O ratio of 1.1 to 1.14. 74 Koshtyal et al measured similar results for their plasma process with NiCp 2 with, Ni/O ratio of 1.15.…”

Section: Ald Of Nickel Oxidementioning

confidence: 99%

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Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications

Napari

Huq

Hoye

et al. 2020

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Nickel oxide (NiOx), a p‐type oxide semiconductor, has gained significant attention due to its versatile and tunable properties. It has become one of the critical materials in wide range of electronics applications, including resistive switching random access memory devices and highly sensitive and selective sensor applications. In addition, the wide band gap and high work function, coupled with the low electron affinity, have made NiOx widely used in emerging optoelectronics and p‐n heterojunctions. The properties of NiOx thin films depend strongly on the deposition method and conditions. Efficient implementation of NiOx in next‐generation devices will require controllable growth and processing methods that can tailor the morphological and electronic properties of the material, but which are also compatible with flexible substrates. In this review, we link together the fundamental properties of NiOx with the chemical processing methods that have been developed to grow the material as thin films, and with its application in electronic devices. We focus solely on thin films, rather than NiOx incorporated with one‐dimensional or two‐dimensional materials. This review starts by discussing how the p‐type nature of NiOx arises and how its stoichiometry affects its electronic and magnetic properties. We discuss the chemical deposition techniques for growing NiOx thin films, including chemical vapor deposition, atomic layer deposition, and a selection of solution processing approaches, and present examples of recent progress made in the implementation of NiOx thin films in devices, both on rigid and flexible substrates. Furthermore, we discuss the remaining challenges and limitations in the deposition of device‐quality NiOx thin films with chemical growth methods.

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“…, with oxygen plasmas respectively. 9,[20][21][22] These studies have demonstrated that conformal growth of NiO is possible with cyclopentadienyl based nickel precursors and O 2 plasma. Given the low cost of nickelocene (Ni(Cp) 2 ), it should be an attractive precursor for ALD.…”

Section: Introductionmentioning

confidence: 98%

Atomic scale surface modification of TiO₂ 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis

et al. 2021

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Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma

Cited by 10 publications

References 23 publications

Dendritic Nanostructured Waste Copper Wires for High-Energy Alkaline Battery

Dendritic Nanostructured Waste Copper Wires for High-Energy Alkaline Battery

Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications

Atomic scale surface modification of TiO₂ 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis

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Characteristics of NiO films prepared by atomic layer deposition using bis(ethylcyclopentadienyl)-Ni and O2 plasma

Cited by 10 publications

References 23 publications

Dendritic Nanostructured Waste Copper Wires for High-Energy Alkaline Battery

Dendritic Nanostructured Waste Copper Wires for High-Energy Alkaline Battery

Nickel oxide thin films grown by chemical deposition techniques: Potential and challenges in next‐generation rigid and flexible device applications

Atomic scale surface modification of TiO2 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis

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Atomic scale surface modification of TiO₂ 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis