Atomic scale surface modification of TiO₂ 3D nano-arrays: plasma enhanced atomic layer deposition of NiO for photocatalysis

Abstract

Here we report the development of a new scalable and transferable plasma assisted atomic layer deposition (PEALD) process for the production of uniform, conformal and pin hole free, NiO with...

TiO2 nanocrystal rods on titanium microwires: growth, vacuum annealing, and photoelectrochemical oxygen evolution

“…A good deposition method to achieve this is atomic layer deposition (ALD), a high aspect ratio technique that does not lose the surface area of the original substrate and has been previously proven as a successful method for creating TiO 2 –NiO heterojunctions on similar TiO 2 nanocrystalline structures. 13…”

“…A good deposition method to achieve this is atomic layer deposition (ALD), a high aspect ratio technique that does not lose the surface area of the original substrate and has been previously proven as a successful method for creating TiO 2 -NiO heterojunctions on similar TiO 2 nanocrystalline structures. 13 In order to explore the robustness of TiO 2 nanocrystal coated titanium microwire electrodes, a long-time photo-chronoamperometric experiment was performed. Fig.…”

“…12 The same TiO 2 nanocrystal rod array system was used in a heterojunction, where the TiO 2 nanocrystals were coated with NiO using atomic layer deposition (ALD), yielding significantly increased photoelectrochemical performance. 13 Here, TiO 2 nanocrystal rods are grown directly onto pre-passivated titanium microwire substrates.…”

A chemist's guide to photoelectrode development for water splitting – the importance of molecular precursor design

“…30). 327 Barecca et al used ALD to coat TiO 2 onto a chemical vapour deposited Fe 2 O 3 film, forming an intimately contacted TiO 2stabilised heterojunction with a 10-fold photocurrent increase due to the enhanced charge separation and transfer. 328,329 ALD can also be used to deposit hybrid materials using either singlesource or dual-source precursors.…”

Practical and Thermal Atomic Layer Deposition of NiO as Hole‐Transporting Layers for Inverted Perovskite Solar Cells

“…ALD, as an enabling technique, is not limited to only PSCs but can also be applied to other optoelectronic devices. [48][49][50][51]…”