2012
DOI: 10.1155/2012/346915
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Characteristics of InGaN‐Based Light‐Emitting Diodes on Patterned Sapphire Substrates with Various Pattern Heights

Abstract: The optical and electrical characteristics of InGaN-based blue light-emitting diodes (LEDs) grown on patterned sapphire substrates (PSSs) with different pattern heights and on planar sapphire by atmospheric-pressure metal-organic chemical vapor deposition were investigated. Compared with planar sapphire, it was found that the LED electroluminescence intensity is significantly enhanced on PSSs with pattern heights of 0.5 (21%), 1.1 (57%), 1.5 (81%), and 1.9 (91%) μm at an injected current of 20 mA. The increase… Show more

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Cited by 11 publications
(7 citation statements)
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“…Over the past few decades, extensive efforts have been addressed ways to improve light extraction efficiency including chip shaping [6], patterned substrate [7,8], photonic crystal [9,10], surface roughening with micro and nano sized texture [11][12][13], nano-porous p-GaN surface [14,15]. Among them surface texture is most feasible and cost effective method.…”
Section: Introductionmentioning
confidence: 99%
“…Over the past few decades, extensive efforts have been addressed ways to improve light extraction efficiency including chip shaping [6], patterned substrate [7,8], photonic crystal [9,10], surface roughening with micro and nano sized texture [11][12][13], nano-porous p-GaN surface [14,15]. Among them surface texture is most feasible and cost effective method.…”
Section: Introductionmentioning
confidence: 99%
“…In recent years, there has been a tremendous effort to increase the performance of nitride based LEDs. One of the methods to improve the light output from LEDs is through the growth of LEDs' epitaxial structure on PSS [1]- [6]. Epitaxial structures grown on PSS also have the added advantages of enhancement in the light extraction from LEDs by providing different escape angles to the light, which otherwise would have been trapped in the GaN LED.…”
Section: Introductionmentioning
confidence: 99%
“…V-shaped defects [5][6][7] readily form at InGaN/GaN quantum wells (QWs) having high indium mole fractions, triggered by threading dislocations in the buffer layer. Several factors can lead to a low-quality InGaN layer, including lattice mismatch between InN and GaN [8], low miscibility of InN [9,10], phase separation [11], indium surface segregation [12], and V-shaped defects [5][6][7]. A growth interruption technique [13,14] can be used to improve the quality of InGaN layers and to enhance the luminescence intensity of LED devices.…”
Section: Introductionmentioning
confidence: 99%