“…Random-c-axis-random [6] c-axis-a-axis [12] T s a-axis-c-axis [9,12] Random-c-axis [17,[24][25][26] c-axis-a-axis [5] The arrow means the tendency of PO change when the corresponding process condition is increased. V b is negative bias voltage, D is the distance between the target and the substrate, J i /J M is the ion/metal flux ratio, P is the total pressure, P O 2 is the partial pressure of oxygen, O 2 /Ar is the gas composition during deposition, and T s is substrate temperature.…”