2010
DOI: 10.4313/teem.2010.11.3.093
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Challenges for Nanoscale MOSFETs and Emerging Nanoelectronics

Abstract: Complementary metal-oxide-semiconductor (CMOS) technology scaling has been a main key for continuous progress in silicon-based semiconductor industry over the past three decades. However, as the technology scaling enters nanometer regime, CMOS devices are facing many serious problems such as increased leakage currents, difficulty on increase of on-current, large parameter variations, low reliability and yield, increase in manufacturing cost, and etc. To sustain the historical improvements, various innovations … Show more

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Cited by 215 publications
(80 citation statements)
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“…The various leakage currents in OFF transistor are subthreshold leakage current, gateinduced drain leakage, junction leakage current, and direct tunneling current [17][18][19].…”
Section: Power Consumption In Sram-based Fpgasmentioning
confidence: 99%
“…The various leakage currents in OFF transistor are subthreshold leakage current, gateinduced drain leakage, junction leakage current, and direct tunneling current [17][18][19].…”
Section: Power Consumption In Sram-based Fpgasmentioning
confidence: 99%
“…The increase of leakage and OFF-current reduces the reliability of a circuit [20]. Massive process variation, critical power overhead, and a decrease in the gate control are other destructive challenges of MOSFET devices at the nanoscale [20]- [22]. According to Moore's law, it can be concluded that the bulk-silicon transistor should be replaced by a promising alternative device in the near future [19].…”
Section: Introductionmentioning
confidence: 99%
“…Another negative effect of miniaturization is the exponential increase of leakage current involving subthreshold voltage caused by scaling down the supply voltage and threshold voltage [19]. The increase of leakage and OFF-current reduces the reliability of a circuit [20]. Massive process variation, critical power overhead, and a decrease in the gate control are other destructive challenges of MOSFET devices at the nanoscale [20]- [22].…”
Section: Introductionmentioning
confidence: 99%
“…To fabricate CMOS transistors into smaller and smaller size [1].It will eventually hits its limitations. Hence several alternatives have been proposed.…”
Section: Introductionmentioning
confidence: 99%