2013
DOI: 10.1039/c2tc00012a
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Cathodoluminescence and field emission from GaN/MgAl2O4grown by metalorganic chemical vapor deposition: substrate-orientation dependence

Abstract: GaN films with single-crystalline and polycrystalline structures were deposited by metalorganic chemical vapor deposition (MOCVD) on ( 111) and (100) MgAl 2 O 4 substrates modified by chemical etching and thermal passivation. The oriented GaN films on the as-processed (111) MgAl 2 O 4 substrate revealed broad visible emission band bands at 3.2 eV and a sharp luminescence peak centered at 1.8 eV in room temperature cathodoluminescence measurements, which can be attributed to the recombination of donor-acceptor … Show more

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Cited by 5 publications
(2 citation statements)
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“…17, has a small lattice mismatch with group III-nitride films, as listed in Table 1, and is therefore a suitable substrate for epitaxial growth of group III-nitrides [83][84][85]. However, the MgAl 2 O 4 substrate has high partial Mg pressure [83,84].…”
Section: Group Iii-nitride Films On Mgal 2 O 4 Substrates By Pldmentioning
confidence: 98%
“…17, has a small lattice mismatch with group III-nitride films, as listed in Table 1, and is therefore a suitable substrate for epitaxial growth of group III-nitrides [83][84][85]. However, the MgAl 2 O 4 substrate has high partial Mg pressure [83,84].…”
Section: Group Iii-nitride Films On Mgal 2 O 4 Substrates By Pldmentioning
confidence: 98%
“…A CL device that uses a field emitter as a cathode electrode radiates rays that considerably fluctuate or flicker. The fluctuation or flicker from a CL device mainly has low frequencies of under 200 Hz [5][6][7][8][9][10]. On the basis of the above problems, a cathode structure that can reduce the fluctuation of emission has been studied [9,10].…”
Section: Introductionmentioning
confidence: 99%