1990
DOI: 10.1016/s0040-6090(05)80007-0
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Cathode voltage-gas composition-film crystallography relationships for sputter-deposited Vanadia (V2O5)

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Cited by 16 publications
(6 citation statements)
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“…1 is ¾19% (Table 2). It is worth noting also that other V 2 O 5 films obtained under the same sputtering conditions 12,13 but with an oxygen percentage of 5-20% previously investigated (see Discussion) had nearly identical peak shape and gave, on average, the same degree of reduction: they could all be fitted with the same set of fitting parameters. Thus the different percentage of oxygen, if above a minimum amount in the sputtering chamber, seems not to influence the obtainable film characteristics and guarantees their required amorphous states, 24 related also to the presence of a limiting number of V 4C centres.…”
Section: Pristine Filmmentioning
confidence: 56%
See 1 more Smart Citation
“…1 is ¾19% (Table 2). It is worth noting also that other V 2 O 5 films obtained under the same sputtering conditions 12,13 but with an oxygen percentage of 5-20% previously investigated (see Discussion) had nearly identical peak shape and gave, on average, the same degree of reduction: they could all be fitted with the same set of fitting parameters. Thus the different percentage of oxygen, if above a minimum amount in the sputtering chamber, seems not to influence the obtainable film characteristics and guarantees their required amorphous states, 24 related also to the presence of a limiting number of V 4C centres.…”
Section: Pristine Filmmentioning
confidence: 56%
“…Software (RUMP version 2.0) was used to simulate the film composition. 12,13 Lithium intercalation was performed in an argonprotected dry-box (model Braun) working at 1 atm pressure with residual contents of water and oxygen of 0.2 and 1000 ppm, respectively, using a three-electrode cell with Li foils as counter and reference electrodes that was controlled by an AMEL 466 potentiostat connected to a Yokogawa A4 X-Y recorder. The V 2 O 5 thin films, shaped in a rectangular form of 1.5 cm ð 1 cm dimensions were used as working electrodes without further preparation.…”
Section: Materials and Electrochemistrymentioning
confidence: 99%
“…19 In this article we report the results of the physical properties of vanadium oxide thin films prepared in our laboratory by the reactive rf sputtering technique by optimising the deposition parameters in order to achieve the best sensing characteristics to ethanol. Due to the rapid quenching of the vapour species, reactive sputtering deposition provides an excellent technique for preparing vanadium oxides over a wide range of stoichiometry, using a V 2 O 5 target 20,21 or a V target 22,23 and O 2 /Ar gases discharges.…”
Section: Introductionmentioning
confidence: 99%
“…A well-known characteristic of reactive sputter deposition from an elemental target is that compound formation at the target surface above a critical reactive gas content, for example oxygen content [21][22]. In that 'mode' of the target, the flux of species sputtered off the target and arriving at the substrate is almost totally in molecular form.…”
Section: Experiments Film Growthmentioning
confidence: 99%
“…in the ultraviolet spectral region, which is the subject of the present paper. Aita et al [17][18][19][20][21] have been studying the effect of various sputter deposition parameters on the vanadia films structural and optical properties grown in Ar/O 2 discharges.…”
Section: Introductionmentioning
confidence: 99%