2014
DOI: 10.1002/pssb.201451176
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Carbon nanotubes overgrown and ingrown with nanocrystalline diamond deposited by different CVD plasma systems

Abstract: In this work we investigate the growth of diamond film on a porous single-wall carbon nanotubes (SWNT) paper by employing three different Chemical Vapour Deposition (CVD) systems: plasma-assisted hot filament, focused microwave plasma and linear antenna microwave plasma. We observe that the diamond growth is strongly affected by the different conditions in each of the CVD processes resulting in different SWNT/diamond composite structures. It is also found that only the linear antenna microwave plasma CVD proce… Show more

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Cited by 6 publications
(3 citation statements)
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“…Further, it is visible that the diamond films morphology also agrees well with the presented Raman spectra. In both Raman spectra, there are three characteristic features: the peak located at 1332 cm À1 is well known as a diamond peak and is related to sp 3 bonds, D-band at $1360 cm À1 related to a small graphite crystallites and finally G-band at $1620 cm À1 [14]. Such a fairly high signal from sp 2 phases in the Raman spectra is observed due to a slow etching of sp 2 -bonded carbon by atomic hydrogen/oxygen during the deposition and it results in the deposition of ultra-or nanocrystalline diamond.…”
Section: Diamond-coated Qcm Device Testingmentioning
confidence: 99%
“…Further, it is visible that the diamond films morphology also agrees well with the presented Raman spectra. In both Raman spectra, there are three characteristic features: the peak located at 1332 cm À1 is well known as a diamond peak and is related to sp 3 bonds, D-band at $1360 cm À1 related to a small graphite crystallites and finally G-band at $1620 cm À1 [14]. Such a fairly high signal from sp 2 phases in the Raman spectra is observed due to a slow etching of sp 2 -bonded carbon by atomic hydrogen/oxygen during the deposition and it results in the deposition of ultra-or nanocrystalline diamond.…”
Section: Diamond-coated Qcm Device Testingmentioning
confidence: 99%
“…Using the bottom-up approach, porosity of the diamond films is achieved by either (i) employing geometrically prestructured substrates (i.e., templated growth) or (ii) optimized chemical vapor deposition (CVD) by providing suitable growth conditions (mainly by varying the gas mixture). The variety of supporting substrates includes fully or partially transformable polymers, 1921 various non-carbon-based templates, 14,17,22,23 carbon-based templates, 2428 or SiO x -based templates. 2931 The important advantage of templated diamond growth is that the porosity is generally guided by the template that is used.…”
Section: Introductionmentioning
confidence: 99%
“…Using the bottom-up approach, porosity of the diamond films is achieved by either (i) employing geometrically prestructured substrates (i.e., templated growth) or (ii) optimized chemical vapor deposition (CVD) by providing suitable growth conditions (mainly by varying the gas mixture). The variety of supporting substrates includes fully or partially transformable polymers, various non-carbon-based templates, ,,, carbon-based templates, or SiO x -based templates. The important advantage of templated diamond growth is that the porosity is generally guided by the template that is used. ,, In the course of the development and usage of these supports, various aspects of procedures that can be used and specific applications have already been discussed. For example, diamond nanoparticles in a polymer matrix can be used for fabricating porous diamond structures, , for enhancing the seeding efficiency in planar diamond deposition and for diamond growth on vertical structures. ,, In the case of diamond deposition on graphitelike materials, the proper seeding technology and the chemical stability of these materials has a direct effect on the final geometry of the structure that is formed. , In addition, the pore size of the templates has a strong influence on the penetration of the growth species in depth (i.e., in the Z -direction) during chemical vapor deposition (CVD).…”
Section: Introductionmentioning
confidence: 99%