Based on the results obtained for C–N and Si–C–N films, a systematic investigation of reactive magnetron sputtering of hard quaternary Si–B–C–N materials has been carried out. The Si–B–C–N films were deposited on p-type Si(100) substrates by dc magnetron co-sputtering using a single C–Si–B target (at a fixed 20% boron fraction in the target erosion area) in nitrogen-argon gas mixtures. Elemental compositions of the films, their surface bonding structure and mechanical properties, together with their oxidation resistance in air, were controlled by the Si fraction (5–75%) in the magnetron target erosion area, the Ar fraction (0–75%) in the gas mixture, the rf induced negative substrate bias voltage (from a floating potential to −500V) and the substrate temperature (180–350°C). The total pressure and the discharge current on the magnetron target were held constant at 0.5Pa and 1A, respectively. The energy and flux of ions bombarding the growing films were determined on the basis of the discharge characteristics measured for the rf discharge dominating in the deposition zone. Mass spectroscopy was used to show composition of the total ion fluxes onto the substrate and to explain differences between sputtering of carbon, silicon and boron from a composed target in nitrogen-argon discharges. The films, typically 1.0–2.4μm thick, possessing a density around 2.4gcm−3, were found to be amorphous in nanostructure with a very smooth surface (Ra⩽0.8nm) and good adhesion to substrates at a low compressive stress (1.0–1.6GPa). They exhibited high hardness (up to 47GPa) and elastic recovery (up to 88%), and extremely high oxidation resistance in air at elevated temperatures (up to a 1350°C substrate limit).

The adhesion, growth and differentiation of human osteoblast-like MG 63 cells were investigated in cultures grown on nanostructured nanocrystalline diamond (NCD) films with either low surface roughness (rms of 8.2 nm) or hierarchically organized surfaces made of low roughness NCD films deposited on Si surfaces with the original microroughness (rms of 301.0 nm and 7.6 nm, respectively). The NCD films were grown using a microwave plasma-enhanced CVD method in an ellipsoidal cavity reactor. The films were treated in oxygen plasma to enhance the hydrophilic character of the diamond surface (water drop contact angle approx. 20 degrees). The samples were then sterilized by 70% ethanol, inserted into 12-well polystyrene multidishes (diameter 2.2 cm), seeded with human osteoblast-like MG 63 cells (40,000 cells/dish, 10,530 cells/cm2) and incubated in 2 ml of DMEM medium with 10% of fetal bovine serum. On day 3 after seeding, the cell numbers were significantly higher on the nanostructured NCD films (72,020 +/- 6540 cells/cm2) and also on the hierarchically micro- and nanostructured films (60200 +/- 6420 cells/cm2) than on the control polystyrene culture dish (40750 +/- 2,530 cells/cm2). The cells on hierarchically micro- and nanostructured diamond substrates also adhered over a significantly larger area (3730 +/- 180 microm2 compared to 2740 +/- 130 microm2 on polystyrene). The cell viability, measured by a LIVE/DEAD viability/cytotoxicity kit, reached 98% to 100% on both types of NCD films. The XTT test showed that the cells on both nanodiamond layers had significantly higher metabolic activity than those on the control polystyrene dish (approx. 2 to 3 times). Immunofluorescence staining of the cells on both NCD films revealed talin-containing focal adhesion plaques and beta-actin filaments, well apparent particularly at the cell periphery, as well as the presence of considerable amounts of osteocalcin, i.e., a marker of osteogenic cell differentiation. These results suggest that nanocrystalline diamond films give good support for adhesion, growth and differentiation of osteogenic cells and could be used for surface modification of bone implants in order to improve their integration with the surrounding bone tissue.

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