2011
DOI: 10.1016/j.solmat.2011.04.010
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Cadmium ion soaking treatment for solution processed CuInSxSe2−x solar cells and its effect on defect properties

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Cited by 17 publications
(29 citation statements)
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“…Caution: Hydrazine is toxic and highly reactive and should be handled with appropriate protective equipment in order to pre v ent contact with either the vapors or liquid . A detailed description of the preparation procedure for the CIS precursor solutions and films can be found elsewhere 18–21…”
Section: Methodsmentioning
confidence: 99%
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“…Caution: Hydrazine is toxic and highly reactive and should be handled with appropriate protective equipment in order to pre v ent contact with either the vapors or liquid . A detailed description of the preparation procedure for the CIS precursor solutions and films can be found elsewhere 18–21…”
Section: Methodsmentioning
confidence: 99%
“…However, significant cost reductions as well as large scale production are necessary to compete with conventional electrical power generation. Most research efforts have been dedicated to the development of non‐vacuum deposition methods for the preparation of the absorber layer in an effort to reduce the cost of producing these devices 10–21. In order for an absorber deposited under atmospheric conditions to significantly offset production costs, it is vital to replace the sputtered i‐ZnO and sputtered ITO or aluminum doped zinc oxide (AZO) layers with transparent conductors that are also compatible with atmospheric deposition on a manufacturing‐scale.…”
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confidence: 99%
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“…Keeping in view of this, Al was used as a replacement for In. In the past, CIS thin films have been prepared using different techniques such as co-evaporation [1], molecular deposition [2], and solution processing [3] etc. Multi-source evaporation was used to grow the absorber films and the buffer layer.…”
Section: Methodsmentioning
confidence: 99%
“…The detailed solutions and the films preparation can be found elsewhere. 5,8,13 The films were annealed on a hot plate at a maximum temperature of 390 C for 30 min, and the final film thickness was around 1 to 1.2 lm. All of the processes described above were completed in a nitrogen-filled drybox.…”
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confidence: 99%