2016
DOI: 10.1364/ome.6.002264
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Bulk sensing performance comparison between silicon dioxide and resonant high aspect ratio nanopillars arrays fabricated by means of interference lithography

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Cited by 15 publications
(14 citation statements)
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“…The lattice parameter among the pillars forming the array is 500 nm and the pillars diameter is around 200 nm. The fabrication of the R-NPs involves several steps, from thin film layer deposition, laser interference lithography, an intermediate lift-off process and a final etching of the pillars; this fabrication process has been reported in detail elsewhere [17].…”
Section: Methodsmentioning
confidence: 99%
See 1 more Smart Citation
“…The lattice parameter among the pillars forming the array is 500 nm and the pillars diameter is around 200 nm. The fabrication of the R-NPs involves several steps, from thin film layer deposition, laser interference lithography, an intermediate lift-off process and a final etching of the pillars; this fabrication process has been reported in detail elsewhere [17].…”
Section: Methodsmentioning
confidence: 99%
“…In previous works we demonstrated the performance of R-NPs made of Si 3 N 4 /SiO 2 [17] and their feasibility to be used as biochem-ical sensors [18,19]. For it, we immersed the pillars in fluids with different refractive index (RI), and we interrogated them vertically from the backside.…”
Section: Introductionmentioning
confidence: 99%
“…These sensing cells were fabricated from a bulk multilayer stack over transparent substrate, consisting of two Bragg reflectors of Si 3 N 4 /SiO 2 and a central cavity of SiO 2 . The process of fabrication included a lithography step, which could be either laser interference lithography [35] or E-beam lithography [36], obtaining pillars with around 200 nm in diameter, several values of pitch and a height in the order of 2 μm. (Fig.…”
Section: Vertical Sensorsmentioning
confidence: 99%
“…4.2 Nano-limited effect for nanocrystal growth An application that combines superhydrophobicity and antireflection by using of hybrid micro-nanostructures is for high-resolution surface enhanced Raman spectrum (SERS) detection [4]. In addition, laser interference is widely used for template fabrication due to its nanofabrication capacities [20,34,63]. The minimum structure period is approximately half of the laser wavelength on the basis of the equation for laser interference period, which provides a way to realize the patterns of nanofeatures.…”
Section: Structures For Optical Manipulationmentioning
confidence: 99%
“…The laser wavelength is usually determined by photoresist linear absorption. Most laser sources are reported at 355 [15], 325 [11,20], 266 [5], 257 [21], and 193 nm at deep ultraviolet wavelengths [22], which limit the resolution of the structures with a minimum period of l/2n. Thus far, the minimum period of 90 nm has been realized by the immersion method with a 45 nm half-pitch and two views of self-aligned frequency-doubled patterns at 22 nm halfpitch, followed by two potassium hydroxide (KOH) etch pattern-transfer steps [22].…”
Section: Introductionmentioning
confidence: 99%