2018
DOI: 10.1364/ao.57.007895
|View full text |Cite
|
Sign up to set email alerts
|

Broadband infrared Mueller-matrix ellipsometry for studies of structured surfaces and thin films

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
13
0

Year Published

2019
2019
2024
2024

Publication Types

Select...
6
1

Relationship

2
5

Authors

Journals

citations
Cited by 18 publications
(13 citation statements)
references
References 30 publications
0
13
0
Order By: Relevance
“…For IRSE, a novel custom built spectroscopic ellipsometer coupled with a Bruker Tensor 37 spectrometer was used . Samples were measured at seven angles of incidence (45, 50, 55, 60, 65, 70, and 75°) to optimally decorrelate film thickness and anisotropy.…”
Section: Methodsmentioning
confidence: 99%
“…For IRSE, a novel custom built spectroscopic ellipsometer coupled with a Bruker Tensor 37 spectrometer was used . Samples were measured at seven angles of incidence (45, 50, 55, 60, 65, 70, and 75°) to optimally decorrelate film thickness and anisotropy.…”
Section: Methodsmentioning
confidence: 99%
“…We have adapted this approach for the presented ellipsometer and derived generalized equations that account for source polarization, polarizer diattenuation, and other nonidealities. 17 In practice, the pure polarization states are realized according to Fig. 2 by appropriate rotation of the polarizers to 0°/90°( linear polarization), to 45°/135°(linear diagonal polarization), or by combining the latter settings with a 90°phase-shifting retarder (circular polarization).…”
Section: B Measurement Principlementioning
confidence: 99%
“…The structures were prepared from an H = 1000 nm thick SiO 2 layer on a Si wafer by photolithographic processing with subsequent wet-chemical etching. 17 Their characteristic structure parameters are the trapezoid's period lengths (P x , P y ), base widths (B x , B y ), and top widths (T x , T y ).…”
Section: D-structured Trapezoidal Silica Arraysmentioning
confidence: 99%
See 1 more Smart Citation
“…This method of analytical measurements is beginning to play an increasing role in various industrial and scientific industries [18]. SE finds application in such applications as the determination of the optical characteristics of thin films [22], in-situ monitoring of semiconductor thin films and their functionality [2,7], as well as currently topical surface probing in biochemical reactions [16,17]. In addition, ellipsometry provides exceptional measurement sensitivity, which makes it possible to use it for monitoring the epitaxial growth of thin films with submonolayer resolution [14,20].…”
Section: Introductionmentioning
confidence: 99%