Bottom-up Filling of through Silicon Vias Using Galvanostatic Cu Electrodeposition with the Modified Organic Additives

Abstract

The chemically synthesized suppressor and leveler are added together with bis(3-sulfopropyl)disulfide (SPS) to galvanostatically fill up the trenches with the similar dimensions to those of the through silicon vias. In our previous study, the deposition of the coarse-grained Cu was indicated as a drawback of the synthesized additives, i.e., polyoxy polymer with amine terminal groups and pyridine derivatives containing additional amine groups. In this study, the modified chemistry of organic additives is used, enabling the bottom-up filling of trenches and improving the microstructure of the deposited Cu. The conversion of the functional groups from amine to hydroxyl groups in both the suppressor and leveler, and the uniform adsorption of modified suppressor improved the microstructure of the deposited Cu. The void-free trench filling is induced by the selective adsorption and accumulation of SPS at the bottom and negligible deposition on the top and side-walls of the trenches. Based on the filling mechanism, the trenches with 9 μm width and 50 μm depth are galvanostatically filled in ≤20 min. Intensive researches have been focused on the fabrication of 3-dimensional (3D) interconnection among electronic devices to achieve a high-density integration and multifunctional single device.1-3 The metallization of through silicon vias (TSVs), one of a promising technology for the 3D packaging, is expected to enhance the operation speed and performance of the microelectronic devices.4-8 A void-free filling of the TSVs by Cu electrodeposition with proper organic additives chemistry has been actively investigated to reduce processing time. 9-11A concentration gradient of suppressing agent, high at the via top while decreasing gradually toward the via bottom, typically induces a bottom-up via filling. The Cu deposit according to the filling time typically reveals a V-shaped profile reflecting the gradient of additive coverage. [12][13][14] Recently, an extreme bottom-up filling of the vias was achieved using one component of additive, suppressor, resulting in a clearly flat filling profile rather than the V-shape. 15,16 Based on the previous results, L. Yang et al. reported that the difference in the adsorption density of suppressing agents between the via top and bottom was required for a void-free bottom-up filling. 17Moreover, the accumulation of accelerator at the bottom of the via was also highlighted in understanding the filling mechanism. In the case of recessed features with submicrometer dimensions, accelerators including bis(3-sulfopropyl)disulfide (SPS) promoted copper deposition, enabling the superconformal filling in the combination with suppressors, based on a curvature-enhanced-accelerator coverage (CEAC) mechanism.18-26 However, the same additive composition or deposition method used in the CEAC model itself mostly failed in the void-free filling of the TSVs. Therefore, additional steps including the selective deactivation of the adsorbed SPS on the top of the vias were introduced to improve the filling perf...

The Influences of Iodide Ion on Cu Electrodeposition and TSV Filling

“…[25][26][27] This combination of organic additives was quite similar to the aforementioned V-shape filling. However, selective accumulation of the accelerator at the bottom of the features was additionally applied to TSV filling.…”

Effects of Acetic Acid, Tartaric Acid and Pb UPD on Cu Electrodeposition in Sub-Micron Trenches

“…[18][19][20][21][22][23] Replacing traditionally used acid-based electrolytes with weak organic acid based electrolytes has recently been studied for copper deposition in through-holes on printed circuit boards. 24,25 These studies showed that replacement of H 2 SO 4 with acetic acid improved film quality.…”

High Accuracy Concentration Analysis of Accelerator Components in Acidic Cu Superfilling Bath

“…Owing to the merits of high throughput, low process cost, and good film quality, Cu electroplating has a wide application, from traditional Cu foil production to state-of-the-art semiconductor metallization processes. [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16] The Cu plating solution typically contains small amounts of organic additives, 1-16 which enhance the uniformity, 13 brightness, 14 and mechanical properties of the Cu film. 15 In addition, for particular application to damascene Cu plating, the additives enable bottom-up filling at trenches or vias by controlling the relative deposition rates of Cu at the top and bottom of the features.…”