2017
DOI: 10.1016/j.matdes.2017.08.025
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Boron films produced by high energy Pulsed Laser Deposition

Abstract: Micron-thick boron films have been deposited by Pulsed Laser Deposition in vacuum on several substrates at room temperature. The use of high energy pulses (>700 mJ) results in the deposition of smooth coatings with low oxygen uptake even at base pressures of 10 -4 -10 -3 Pa. A detailed structural analysis, by X-Ray Diffraction and Raman, allowed to assess the amorphous nature of the deposited films as well as to determine the base pressure that prevents boron oxide formation. In addition the crystallization dy… Show more

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Cited by 34 publications
(21 citation statements)
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“…Yet the film material is not elastically identical to nanocrystalline graphite: in fact the values of B (and, consequently, ν) are significantly different. Similar problems are discussed in [33].…”
Section: Films Grown By a Focused Beammentioning
confidence: 65%
“…Yet the film material is not elastically identical to nanocrystalline graphite: in fact the values of B (and, consequently, ν) are significantly different. Similar problems are discussed in [33].…”
Section: Films Grown By a Focused Beammentioning
confidence: 65%
“…The thermomechanical characterization is performed exploiting Brillouin spectroscopy (BS) and the substrate curvature method (SC). The coupling of these two techniques has been shown to be a powerful tool for the characterization of nanostructured films, providing a broad, non destructive characterization of the samples [23,24,25]. In particular, when transparent oxide coatings are investigated, BS can be able to derive, through the detection of surface and bulk acoustic waves, all the elastic moduli of the films (i.e.…”
mentioning
confidence: 99%
“…4) A potential application of boron films is as protective coatings, since they exhibit high hardness and low brittleness; in addition, the boron surface is oxidized when exposed to ambient air, producing a hydroxide layer that can act as a solid lubricant. 5) Despite this, thin films of pure boron have seldom been used as high hardness coatings owing to the technological difficulties in producing homogeneous and crystalline films. 6) Boron is a difficult material to work with because of the variety of systems in which it crystallizes and the diversity of morphologies that can be obtained with it.…”
Section: Introductionmentioning
confidence: 99%
“…7) Boron exhibits four main allotropes that are arranged in a framework of icosahedral motifs (B12): 8) -rhombohedral, where the B12 motifs are present on the edges of the cell; -rhombohedral, where the B12 icosahedra are positioned at the vertices of the rhombohedral unit cell; -orthorhombic phase, with a rocksalt type arrangement; and the amorphous phase, in which the long-range order is lost, but the short-range order of the B12 icosahedra is retained. 5) Single crystals of -boron can be prepared from a boron-platinum melt at high pressures (6)(7)(8)(9)(10)(11) and temperatures. 9) Boron films have been prepared by several methods, including plasma-assisted CVD of boron trichloride 10,11) and diborane; 12) laser ablation; 5) magnetron sputtering; 13) pyrolysis; 12) and thermionic vacuum arc.…”
Section: Introductionmentioning
confidence: 99%