“…The mechanism of glass-to-glass bonding is similar to a conventional silicon-to-glass electrostatic bonding. Such bonding can only be achieved using interlayers (Ju et al 1998), and at least one intermediate layer such as amorphous silicon (Lee et al 2000;Wei et al 2004;Kutchoukov et al 2004, Berthold et al 2000, Lee et al 2001, polysilicon (Berthold et al 2000;Xue and Qiu 2005), silicon nitride, carbide or oxide or a combination of them (Berthold et al 2000), or a titanium thin film interlayer (Briand et al 2004;Mrozek 2009). With low temperature bonding, no appreciable flow of the glass occurs, hence enabling sealing around previously machined grooves, cavities, etc.…”