Beeinflussung von Elektronen-Austrittspotential und elektrischem Widerstand aufgedampfter Filme von Fe, Ni, Cu, Zn und Ga durch Adsorption von Kohlenmonoxyd bei 90°K und 293°K

Suhrmann, R.; Ober, H.; Wedler, G.

doi:10.1524/zpch.1961.29.5_6.305

Cited by 15 publications

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“…A resistance increase as large as 30% has been reported for an ϳ100 Å-thick Cu film covered with an adsorbed layer of CO gas molecules. 3 Explanations such as a transfer of charge from the metal to the adsorbent or a demetalization effect in which the adsorbent atoms form an insulating surface complex with the metal underlayer have been proposed but are not universally agreed upon. 1 Perhaps the most compelling explanation involves the above-mentioned scattering of conduction electrons at the interface; the adsorbed atoms give rise to diffuse scattering with a concomitant increase in resistivity that becomes particularly pronounced for small thicknesses.…”

Section: Introductionmentioning

confidence: 99%

Charge transfer and surface scattering at Cu-C60planar interfaces

Hebard¹,

Ruel²,

Eom³

1996

Phys. Rev. B

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Thin-film planar structures of Cu and C 60 have been sequentially deposited onto sapphire substrates in high vacuum and studied using in situ resistivity measurements during deposition together with ex situ atomic force microscopy characterization of surface topography. Two different regimes of behavior are identified. In the first of these, the thin-film limit in which the Cu is thin enough to be in the coalescence regime with an islanded morphology, the presence of an adjacent C 60 monolayer, doped by charge transfer from the metal, creates a shunting path and a corresponding pronounced decrease in resistance. The sheet resistance of overlying doped monolayers is found to be ϳ8000 ⍀, with a corresponding room-temperature resistivity that is a factor of 2 less than that of the three-dimensional alkali-metal-doped compounds A 3 C 60 ͑AϭK, Rb͒. The enhanced conductivity of an underlying monolayer of C 60 is sufficient to reduce the critical thickness at which an overlying Cu film becomes conducting by almost a factor of 2 even though the roughness of such films is enhanced over that of Cu films deposited directly on the substrate. In the second regime of behavior, the continuous film limit in which the Cu is thick enough to have a size-effect resistivity proportional to the reciprocal of the film thickness, the presence of an adjacent C 60 monolayer gives rise to an increase in resistance. Measurements on a number of samples with different thicknesses reveal that this resistance increase is best described by diffuse surface scattering. A scattering cross section of 5 Å 2 resulting from a fit to this model represents the contact area under each C 60 molecule. ͓S0163-1829͑96͒04643-7͔

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Section: Introductionmentioning

confidence: 99%

Charge transfer and surface scattering at Cu-C60planar interfaces

Hebard¹,

Ruel²,

Eom³

1996

Phys. Rev. B

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“…Since the conductivity of the surface layer of close-packed iron and nickel surfaces is not affected, it is likely that the adsorbed carbon monoxide molecules are scattering the conduction electrons. This conclusion is substantiated by an observation of Suhrmann, Ober and Wedler (1961) on the change in conductance of copper films by adsorption of carbon monoxide.…”

Section: Fig 65 Decrease In Conductance (λ) Of An Evaporated Nickelmentioning

confidence: 65%

“…Unlike the effect of carbon monoxide on the electrical conductance of iron films, the change in conductance of nickel films by carbon monoxide has been studied much more profoundly (Zwietering, Koks and van Heerden, 1959;Suhrmann, Wedler and Heyne, 1959;Suhrmann, Ober and Wedler, 1961;Geus, 1964;Wedler and Fouad, 1964;Cukr, Merta, Adamek and Ponec, 1965). Since nickel atoms, which crystallize in the f.c.c.…”

Section: Jcatal 2 274)mentioning

confidence: 99%

The Influence of Adsorption on Electrical and Magnetic Properties of Thin Metal Films

Geus

1971

Chemisorption and Reactions on Metallic Films

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Änderung des Halleffekts bei der Chemisorption an aufgedampften Metallfilmen

Hansen

Littmann

1963

Ber Bunsenges Phys Chem

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Es werden Experimente beschrieben, in denen der Halleffekt von aufgedampften Zirkonium‐, Kupfer‐, Eisen‐ und Nickelfilmen während einer Sorption untersucht wurde. Nach der Chemisorption von Kohlenmonoxid treten unabhängig vom Leitungstyp nur Vergrößerungen der Hallspannung auf, die wie die Änderungen des elektrischen Widerstandes durch eine Verringerung der effektiven metallischen Schichtdicke hervorgerufen werden.

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Beeinflussung von Elektronen-Austrittspotential und elektrischem Widerstand aufgedampfter Filme von Fe, Ni, Cu, Zn und Ga durch Adsorption von Kohlenmonoxyd bei 90°K und 293°K

Cited by 15 publications

References 0 publications

Charge transfer and surface scattering at Cu-C60planar interfaces

Charge transfer and surface scattering at Cu-C60planar interfaces

The Influence of Adsorption on Electrical and Magnetic Properties of Thin Metal Films

Änderung des Halleffekts bei der Chemisorption an aufgedampften Metallfilmen

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