The Influence of Adsorption on Electrical and Magnetic Properties of Thin Metal Films

Geus, J.W.

doi:10.1016/b978-0-12-058001-9.50010-9

Cited by 3 publications

(3 citation statements)

References 185 publications

(59 reference statements)

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“…Irreversible changes in resistance have been attributed to changes in the film structure as a result of chemisorption (Lazarov & Manev, 1977). Reversible changes may be due to the change in the electronic work function of the metal surface from adsorbatemetal atom interactions (Geus, 1971).…”

Section: Introductionmentioning

confidence: 99%

Investigation of mercury adsorption on gold films by STM

George

Glaunsinger

Thundat

et al. 1988

Journal of Microscopy

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KEY w ORDS . Mercury adsorption, gold films, scanning tunnelling microscopy. S U M M A R YScanning tunnelling microscopy, combined with complementary electrical and analytical measurements, provides a powerful method for examining the behaviour of mercury on gold-film sensors under actual sensor operating conditions. The films exhibit a linear increase in resistance upon adsorption of mercury, and this resistive change is accompanied by a decrease in measured barrier height at submonolayer coverages of mercury. STM studies of changes in the effective barrier height upon mercury adsorption provide evidence that mercury migrates to grain boundaries for films exposed at submonolayer coverages. Coverages in excess of a monolayer result in a nearly constant, reduced effective barrier height across the entire surface, which is indicative of a more uniform distribution of mercury over the surface. This behaviour is interpreted in terms of the adsorption of mercury onto defective, contaminated gold surfaces.

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Section: Introductionmentioning

confidence: 99%

Investigation of mercury adsorption on gold films by STM

George

Glaunsinger

Thundat

et al. 1988

Journal of Microscopy

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“…The roughness factor of the Fe ®lm annealed at 330 K, based on the results of volumetrical adsorption of deuterium and nitrogen at 78 K, was estimated to be 8 AE 1 [16], whereas the roughness factor of the Fe ®lm warmed up to 195 K was higher than 15 [20]. A difference in curvature of the surface was postulated earlier to be a driving force for surface self-diffusion [21]. The activation energy of surface self-diffusion (E d ) was found to be relatively low (<1 eV) on the lowindex planes of various metals [22].…”

Section: Discussionmentioning

confidence: 99%

“…1(a) and 2(a) one can observe features characteristic for a ®lm evaporated at very low temperatures t < 0:1: small grains adopt random orientation and the microvoids are visible. Microvoids are expected to be formed during the ®lm growth on a substrate maintained at 78 K [17,21]. Iron atoms evaporated from a hot source are quenched on the cold substrate as they condense and lose energy rapidly.…”

Section: Discussionmentioning

confidence: 99%

TEM and SEM studies of microstructural transformations of thin iron films during annealing

Lisowski¹,

Keim²,

Smithers³

2002

Applied Surface Science

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Quantitative determination of the kinetics of the reaction of NiO and Al₂O₃ to NiAl₂O₄ by Rutherford backscattering

Roos

Fluit

Velthuizen

et al. 1983

Surface & Interface Analysis

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A quantitative evaluation of RBS data resulted in data for the parabolic reaction rate constants for the reaction between Alsoj and NiO at temperatures from 96OOC up to 1105OC. The activation energy and the preexponential factor were in good agreement with literature data. The experimental data of this work also permitted a detailed description of reaction mechanisms on a microscopic level. The reaction between Also3 and NiO starts with penetration of A13+ ions along the grain boundaries of NiO, followed by counter-dilfusion of Niz+ ions. A thin spinel layer (NiAI,O,) is formed at the AIz03/Ni0 interface, after a relatively short nucleation period. The reaction then proceeds, both by lateral and perpendicular diffusion. In an appendm, the detailed evaluation procedure of the spectra was described.

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The Influence of Adsorption on Electrical and Magnetic Properties of Thin Metal Films

Cited by 3 publications

References 185 publications

Investigation of mercury adsorption on gold films by STM

Investigation of mercury adsorption on gold films by STM

TEM and SEM studies of microstructural transformations of thin iron films during annealing

Quantitative determination of the kinetics of the reaction of NiO and Al₂O₃ to NiAl₂O₄ by Rutherford backscattering

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The Influence of Adsorption on Electrical and Magnetic Properties of Thin Metal Films

Cited by 3 publications

References 185 publications

Investigation of mercury adsorption on gold films by STM

Investigation of mercury adsorption on gold films by STM

TEM and SEM studies of microstructural transformations of thin iron films during annealing

Quantitative determination of the kinetics of the reaction of NiO and Al2O3 to NiAl2O4 by Rutherford backscattering

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Quantitative determination of the kinetics of the reaction of NiO and Al₂O₃ to NiAl₂O₄ by Rutherford backscattering