2007 IEEE 20th International Conference on Micro Electro Mechanical Systems (MEMS) 2007
DOI: 10.1109/memsys.2007.4433180
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Batch fabrication of carbon nanotubes on tips of a silicon pyramid array

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Cited by 4 publications
(4 citation statements)
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“…A higher precision for positioning the CNTs is obtained when the intensity of the electric field is increased by utilising sharp Si pyramids. 192 A tetramethyl ammonium hydroxide (TMAH) based etching step is used to anisotropically etch Si and create the pyramids. This is followed by thermal oxidation and catalyst layer (iron and cobalt) deposition.…”
Section: Growth Studiesmentioning
confidence: 99%
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“…A higher precision for positioning the CNTs is obtained when the intensity of the electric field is increased by utilising sharp Si pyramids. 192 A tetramethyl ammonium hydroxide (TMAH) based etching step is used to anisotropically etch Si and create the pyramids. This is followed by thermal oxidation and catalyst layer (iron and cobalt) deposition.…”
Section: Growth Studiesmentioning
confidence: 99%
“…278 The level of difficulty associated with this kind of assembly becomes clear when one compares the attachment of a CNT on to a Si tip through manipulation inside an SEM 66 and the growth of CNTs on multiple Si tips through CVD in an electric field. 192…”
Section: Manipulationmentioning
confidence: 99%
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“…In literature several other methods are often described such as the attachment of a carbon nano tube to a tip [33][34][35], or focused ion beam etching [36,37] and electron beam etching [36] of a sharp tip. These methods are however not considered here, as these methods work only in a serial fashion, thus one tip is etched at the time using focused ion beam etching, for example.…”
Section: Tip Fabrication Methodsmentioning
confidence: 99%