2020
DOI: 10.1038/s41929-020-00522-9
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Band structure engineering and defect control of Ta3N5 for efficient photoelectrochemical water oxidation

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Cited by 257 publications
(206 citation statements)
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“…For the photoactivated samples from 6 to 20 h, both τ 1 and τ 2 become longer, and the fractional intensity of the fast component ( ƒ 1 ) decreases, suggesting that the induced oxygen vacancies effectively suppress the defect‐related charge recombination. [ 39,40 ] In contrast, after 45 h of electrode, the lifetime decreases, coinciding with the above‐described PEC results. These results highlight the importance of having proper oxygen vacancies to facilitate the charge carrier transfer.…”
Section: Resultssupporting
confidence: 86%
“…For the photoactivated samples from 6 to 20 h, both τ 1 and τ 2 become longer, and the fractional intensity of the fast component ( ƒ 1 ) decreases, suggesting that the induced oxygen vacancies effectively suppress the defect‐related charge recombination. [ 39,40 ] In contrast, after 45 h of electrode, the lifetime decreases, coinciding with the above‐described PEC results. These results highlight the importance of having proper oxygen vacancies to facilitate the charge carrier transfer.…”
Section: Resultssupporting
confidence: 86%
“…The authors confirmed the reduction of surface recombination by PL spectra and the increase of carrier concentration, probably due to substituted oxygen. Xiao et al reported another doping method: gradient doping of Mg. [ 101 ] The authors confirmed the band‐edge shift by Mg doping, and they produced a band slope in Ta 3 N 5 bulk by making a gradient concentration of Mg. The gradient Mg‐doped Ta 3 N 5 showed a high photocurrent density of 8.5 mA cm −2 at 1.23 V versus RHE with a low onset potential of ≈0.4 V versus RHE, probably due to the internal electric field and reduced defect‐related recombination.…”
Section: Solutionmentioning
confidence: 77%
“…Cation doping (B, Mg, Sc, and Zr) has also been conducted for opaque Ta 3 N 5 photoanodes to shift the onset potential. [53][54][55][56]58,101] [58] The Ta 3 N 5 : MgþZr photoanode demonstrated a lower onset potential of 0.55 V versus RHE compared to that of Ta 3 N 5 , 0.8 V versus RHE with a photocurrent of 2.3 mA cm À2 at 1.23 V versus RHE (Figure 12a). Because the onset potentials of Ta 3 N 5 :Mg and Ta 3 N 5 :Zr were 0.70 and 0.57 V versus RHE, respectively, the authors concluded that Zr caused a negative shift in the onset potential (Figure 12a).…”
Section: Dopingmentioning
confidence: 99%
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“…Tantalum nitride and tantalum oxynitrides have gained considerable attention in the photoelectrochemical community due to the favorable position of valence and conduction band for overall water splitting, and light absorption in the visible range. [ 43–45 ] By ALD, they can be prepared using H 2 O as an oxygen precursor to prepare Ta 2 O 5 , followed by annealing in ammonia (NH 3 ) to produce Ta 3 N 5 , [ 46 ] or directly by using NH 3 gas as nitride precursor in ALD. [ 47 ] TaO x N y has been achieved by the use of NH 3 as a nitride precursor and H 2 O as an oxygen precursor.…”
Section: Light Absorbermentioning
confidence: 99%