Automated AFM as an Industrial Process Metrology Tool for Nanoelectronic Manufacturing

Bao, Tianming; Fong, David; Hand, Seán

doi:10.1007/978-3-540-74085-8_12

Cited by 1 publication

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“…From its inception to the present, the measurement of etched silicon and photoresist features in semiconductor manufacturing has been the primary application arena for CD-AFM [28]. More recently, the technology is also gaining use within the data storage industry [29]. The technology has been available commercially since the mid-1990s.…”

Section: Overview and Designmentioning

confidence: 99%

Scanning probe microscope dimensional metrology at NIST

Kramar

Dixson

Orji

2010

Meas. Sci. Technol.

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Scanning probe microscope (SPM) dimensional metrology efforts at the US National Institute of Standards and Technology (NIST) are reviewed in this paper. The main SPM instruments for realizing the International System of Units (SI) are the Molecular Measuring Machine, the calibrated atomic force microscope and the critical dimension atomic force microscope. These are optimized for long-distance measurements, three-dimensional measurements over conventional SPM distances and critical dimension or linewidth measurements, respectively. 10 mm distances have been measured with the relative standard uncertainty, uc, of 1.5 × 10−5; step heights at the 100 nm scale have been measured with the relative uc of 2.5 × 10−3 and sub-micrometer linewidths have been measured with uc = 0.8 nm.

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Section: Overview and Designmentioning

confidence: 99%