2015
DOI: 10.1002/pen.24068
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Atomic layer deposition TiO2/Al2O3 nanolayer of dyed polyamide/aramid blend fabric for high intensity UV light protection

Abstract: Ultraviolet (UV) irradiation can cause a severe damage to textiles, such as color fading, polymer degradation, and mechanical strength decrease. The aim of this study was to deposit inorganic UV blocking agents onto polyamide/ aramid dyed fabric using atomic layer deposition (ALD) technique to produce functional fabrics that are resistant to high intensity UV light. Scanning electron microscopy (coupled to energy-dispersive spectroscopy), X-ray photoelectron spectroscopy, and thermogravimetry studies demonstra… Show more

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Cited by 27 publications
(10 citation statements)
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“…It is known that Al 2 O 3 attenuates UV light and coupled with its low oxygen diffusion constant inhibits the photo-oxidation process. [40][41][42] However, further studies may be needed to verify this aspect. The fact remains that from the time of exfoliation/deposition of BP till the time it is encapsulated, oxide species are inevitably formed on the surface and it is impractical to assume otherwise.…”
Section: Physical Routes: Passivation Layersmentioning
confidence: 99%
“…It is known that Al 2 O 3 attenuates UV light and coupled with its low oxygen diffusion constant inhibits the photo-oxidation process. [40][41][42] However, further studies may be needed to verify this aspect. The fact remains that from the time of exfoliation/deposition of BP till the time it is encapsulated, oxide species are inevitably formed on the surface and it is impractical to assume otherwise.…”
Section: Physical Routes: Passivation Layersmentioning
confidence: 99%
“…Some fabrics such as cotton, silk, wool, cellulose, polyvinyl alcohol, polyamide are kind of fabrics with abundant surfacebound active groups including -OH, -COOH, -NH 2 , which are widely accepted as effective groups to form covalent bond with ALD inorganic layers (ZnO, TiO 2 , Al 2 O 3 and so on). The multiple functions properties, such as antibiosis, UV-blocking [15], antioxidation [16][17][18], superhydrophobicity [13,19], conductivity [11,[20][21][22][23][24][25][26][27][28][29][30][31], and retardancy [32,33] could be endowed to polymeric fabrics after ALD of different inorganic layers onto their surface.…”
Section: Polymeric Fabrics With Copious Reactive Groupsmentioning
confidence: 99%
“…Inorganic UV absorbers like ZnO, SiO 2 , and TiO 2 in the micro-or nanoscale are in particularly attractive due to their superior performance. Xiao et al [15] deposited TiO 2 , Al 2 O 3 , and TiO 2 /Al 2 O 3 nano-layer onto dyed polyamide/aramid blend fabric surface. The dyed fabrics after ALD coating showed excellent UV resistance and high resistant to UV-induced mechanical strength damage.…”
Section: Current Trends In Fashion Technology and Textile Engineeringmentioning
confidence: 99%
“…However many researchers have found that many hydrophilic polymers were incompatible with PVDF, which will result in a decrease in mechanical strength , and with the increasing of using time, some hydrophilic polymers can spread out from membrane matrix which could lead to a decrease in the hydrophilicity and in the anti‐fouling property as well . Compared with the hydrophilic polymers, the addition of nanoparticles, like titanium dioxide (TiO 2 ) , alumina (Al 2 O 3 ) , zirconium dioxide (ZrO 2 ) , and silica (SiO 2 ) , can enhance membrane permeability, hydrophilicity, mechanical strength, rejection, and membrane surface formation as well. Of all nanoparticles, SiO 2 was used most extensively because of its properties of ease handling and superior mechanical and thermal stability .…”
Section: Introductionmentioning
confidence: 99%