Argon metastables in HiPIMS: time-resolved tunable diode-laser diagnostics

Vițelaru, Cătălin; Lundin, Daniel; Stancu, Gabi-Daniel; Brenning, Nils; Bretagne, J.; Minea, Tiberiu

doi:10.1088/0963-0252/21/2/025010

Cited by 93 publications

(108 citation statements)

References 45 publications

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“…The discharge will likely ignite as a localized glow discharge at the target substrate in the vicinity of the anode ring, where the vacuum electric field is the strongest, which thus leads to a rather small current in the radial direction in the case of a circular magnetron. 265 Time resolved tunable diode-laser absorption spectroscopy measurements by Vitelaru et al 247 show that there is a very strong increase in the emission from the metastable working gas atoms (Ar m ) during phase 1, which is seen in Fig. 15.…”

Section: E Modes Of Operationmentioning

confidence: 93%

“…Also the neutral gas temperature starts to increase reaching around 600-800 K (Fig. 15), 247 which is likely due the increasing amount of collisions taking place. Using optical emission spectrometry Hála et al 136 also find that there is an initial strong increase in the emission from the neutral working gas as seen in Fig.…”

Section: E Modes Of Operationmentioning

confidence: 99%

“…Liebig et al 203 apply 2D OES to explore the spatial and temporal behavior of the argon working gas and also observe gas rarefaction. In addition, Vitelaru et al 247 have recently performed time resolved tunable diode-laser absorption spectroscopy measurements of the argon metastable (Ar m ) density in an HiPIMS discharge driven by 200 ls pulses while sputtering a Ti target. From the Doppler profile the evolution of the temperature and density were derived during the pulse as well as during the plasma afterglow.…”

Section: B Neutral Particle Flow-rarefactionmentioning

confidence: 99%

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High power impulse magnetron sputtering discharge

Guðmundsson¹,

Brenning²,

Lundin³

et al. 2012

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

626

446

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The high power impulse magnetron sputtering (HiPIMS) discharge is a recent addition to plasma based sputtering technology. In HiPIMS, high power is applied to the magnetron target in unipolar pulses at low duty cycle and low repetition frequency while keeping the average power about 2 orders of magnitude lower than the peak power. This results in a high plasma density, and high ionization fraction of the sputtered vapor, which allows better control of the film growth by controlling the energy and direction of the deposition species. This is a significant advantage over conventional dc magnetron sputtering where the sputtered vapor consists mainly of neutral species. The HiPIMS discharge is now an established ionized physical vapor deposition technique, which is easily scalable and has been successfully introduced into various industrial applications. The authors give an overview of the development of the HiPIMS discharge, and the underlying mechanisms that dictate the discharge properties. First, an introduction to the magnetron sputtering discharge and its various configurations and modifications is given. Then the development and properties of the high power pulsed power supply are discussed, followed by an overview of the measured plasma parameters in the HiPIMS discharge, the electron energy and density, the ion energy, ion flux and plasma composition, and a discussion on the deposition rate. Finally, some of the models that have been developed to gain understanding of the discharge processes are reviewed, including the phenomenological material pathway model, and the ionization region model.

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Section: E Modes Of Operationmentioning

confidence: 93%

Section: E Modes Of Operationmentioning

confidence: 99%

Section: B Neutral Particle Flow-rarefactionmentioning

confidence: 99%

See 1 more Smart Citation

High power impulse magnetron sputtering discharge

Guðmundsson¹,

Brenning²,

Lundin³

et al. 2012

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

626

446

View full text Add to dashboard Cite

show abstract

“…In this current rise phase, a dense plasma torus is developed above the target race track [20] and the metal atom density builds up due to sputtering of the working gas ions. With increasing number of metal atoms, Penning ionization of the sputtered vapour atoms as well as electron impact ionization of neutral gas atoms increases [21]. For this reason, the current rise is dominated by metal ions, which accelerate back to the target and take part in sputtering process [17].…”

Section: Advances In Materials Science and Engineeringmentioning

confidence: 99%

“…At the end of the plateau phase in case of 200 to 500 Hz and after voltage switch-off in case of 100 Hz, the discharge shifts into the afterglow phase. This phase is characterized by a sharp drop down of current due to the loss of plasma species in the target vicinity through recombination and diffusion towards the substrate and chamber walls [21].…”

Section: Advances In Materials Science and Engineeringmentioning

confidence: 99%

Effect of HPPMS Pulse-Frequency on Plasma Discharge and Deposited AlTiN Coating Properties

Severin

Naveed

Weiß

2017

Advances in Materials Science and Engineering

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Coatings like TiAlN (titanium content more than 50%) or AlTiN (aluminium content more than 50%) are well established as hard and wear-resistant tool coatings, often prepared by physical vapour deposition (PVD) like arc evaporation or direct current magnetron sputtering (dcMS). With increasing challenges of operating conditions, there is a constant need for improvement of mechanical properties to withstand extreme loading conditions. This can be obtained by a higher amount of ionized sputtered metal atoms during the deposition process. To increase the metal ion flux a high-power pulse magnetron sputtering (HPPMS) was developed. In order to understand the relation between HPPMS process parameters and mechanical properties of the AlTiN coatings, the present study discusses how different pulse-frequencies (for a constant pulse length) influence AlTiN coating structure growth and their mechanical properties. In addition, film deposition rate and phase formation are influenced by altering process parameters like pulse length and frequency. Hence, different pulse-frequencies produce specific coatings with corresponding properties for functional requirements. Based on the established findings, answers to new scientific queries along with the demand to further optimize these coatings for tool applications are required.

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An Overview on Time‐Resolved Optical Analysis of HiPIMS Discharge

Britun

Konstantinidis

Snyders

2015

Plasma Processes & Polymers

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The progress in the time-resolved characterization of HiPIMS discharges performed during the last decade in our group is overviewed. Optical emission and absorption spectroscopy, as well as laser-induced fluorescence-based techniques have been mainly utilized. The results covering such important aspects of the HiPIMS discharge as the density evolution of the discharge species, their ionization and excitation, propagation of secondary electrons in the discharge volume, dynamics of velocity distribution of the discharge species, gas rarefaction, etc. are discussed.

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Argon metastables in HiPIMS: time-resolved tunable diode-laser diagnostics

Cited by 93 publications

References 45 publications

High power impulse magnetron sputtering discharge

High power impulse magnetron sputtering discharge

Effect of HPPMS Pulse-Frequency on Plasma Discharge and Deposited AlTiN Coating Properties

An Overview on Time‐Resolved Optical Analysis of HiPIMS Discharge

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