2009
DOI: 10.1143/jjap.48.116502
|View full text |Cite
|
Sign up to set email alerts
|

Application of Vacuum-Assisted Filling System with Ultraviolet-Light-Emitting Diode Array to Fabrication of Waveguide Microstructures

Abstract: In this study, we proposed a novel technology for developing a nanoscale, high-resolution, and cost-efficient next-generation semiconductor process that uses exposure technology with ultraviolet-light-emitting diode (UV-LED) arrays and poly(dimethylsiloxane) (PDMS) flexible soft mold imprint technology in order to develop a vacuum-assisted photoresist filling technology for microstructures. By integrating the characteristics of the PDMS soft mold, photocure resist, and vacuum-assisted filling system to fabrica… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1

Citation Types

0
3
0
1

Year Published

2010
2010
2017
2017

Publication Types

Select...
7

Relationship

0
7

Authors

Journals

citations
Cited by 8 publications
(4 citation statements)
references
References 7 publications
0
3
0
1
Order By: Relevance
“…Lan等人 [18] 提出了一种释放 压力减少变形的载荷施加方法, 用于PDMS软模UV 固化成形工艺中减少几何畸变. Weng等人 [19] [21] 研究了黏度、壁面滑移和表面张力等尺度依赖 的参数对材料充型的影响, 发现当流道尺寸在几微 米或者更小时总会出现壁面滑移现象. Tian等人 [22] 此外, Neo和Park [25] 进一步完善了模型来描述紫外光 固化过程中的单体转化.…”
Section: 残余层是充型过程中的另一类缺陷 对光线吸unclassified
“…Lan等人 [18] 提出了一种释放 压力减少变形的载荷施加方法, 用于PDMS软模UV 固化成形工艺中减少几何畸变. Weng等人 [19] [21] 研究了黏度、壁面滑移和表面张力等尺度依赖 的参数对材料充型的影响, 发现当流道尺寸在几微 米或者更小时总会出现壁面滑移现象. Tian等人 [22] 此外, Neo和Park [25] 进一步完善了模型来描述紫外光 固化过程中的单体转化.…”
Section: 残余层是充型过程中的另一类缺陷 对光线吸unclassified
“…If the roll imprinting velocity is increased, it may result in too short roll imprinting time and poor formation [4][5][6]. Therefore, to properly improve the evenness of roll imprinting force and increase roll imprinting velocity are the major problems in urgent need of improvement for the roll imprinting process at the present stage [7][8][9][10].…”
Section: Introductionmentioning
confidence: 99%
“…Compared with plane imprint technology, roller imprint technology has advantage of continuous mass production and shortened imprint cycle [6][7][8][9]. Furthermore, general roller imprint forms microstructure on the roller or coats over the roller; however, due to difficulty in close adhesion, mould displacement and twists often occur in rolling, and imprinting with a soft mould causes problems, such as insufficient strength and intolerance to high temperatures [10][11][12][13][14][15][16]. To improve the above disadvantages, this study independently developed and assembled a magnetic roller imprint machine, and attempted to use a magnetic-aided [17][18][19] roller microstructure imprint process to continuously replicate a microstructure on a magnetic roller to a polymer film surface, which utilizes magnetic attraction force between magnetic rollers to create highly conformal imprinting.…”
Section: Introductionmentioning
confidence: 99%