2017
DOI: 10.1016/j.jallcom.2016.11.313
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Anomalous Hall effect in one monolayer cobalt with electrical manipulation

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Cited by 4 publications
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“…To avoid the extra etching process, the samples which were relatively long and narrow were located by optical microscope (Carl Zeiss Imager.A2 Vario with AxioCam HRc), and then their thicknesses were confirmed by atomic force microscope (Asylum Research MFP-3D) using tapping mode. After that, 0.8 nm Ti was evaporated onto the samples using ebeam evaporator, and then they were exposed in air for 0.5 h to form an oxidation layer (the TiO X layer not only plays a role of tunneling layer to conquer the conductance mismatch problem but also prevents the sample from reacting with ionic liquid) [53]. Subsequently, six electrodes were fabricated for each sample using e-beam lithography (EBL) and followed e-…”
Section: Methodsmentioning
confidence: 99%
“…To avoid the extra etching process, the samples which were relatively long and narrow were located by optical microscope (Carl Zeiss Imager.A2 Vario with AxioCam HRc), and then their thicknesses were confirmed by atomic force microscope (Asylum Research MFP-3D) using tapping mode. After that, 0.8 nm Ti was evaporated onto the samples using ebeam evaporator, and then they were exposed in air for 0.5 h to form an oxidation layer (the TiO X layer not only plays a role of tunneling layer to conquer the conductance mismatch problem but also prevents the sample from reacting with ionic liquid) [53]. Subsequently, six electrodes were fabricated for each sample using e-beam lithography (EBL) and followed e-…”
Section: Methodsmentioning
confidence: 99%