2011
DOI: 10.1134/s1063782611060108
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Annealing-induced evolution of optical properties of the multilayered nanoperiodic SiO x /ZrO2 system containing Si nanoclusters

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Cited by 20 publications
(5 citation statements)
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“…Amorphous SiOx/SiO2 multilayers were deposited on a p‐type crystalline Si (100) substrate by alternate vacuum evaporation of the corresponding initial materials, in accordance with the procedure used in (). The SiOx layers were produced by evaporation of SiO powder in a tantalum Knudsen effusion cell, while the SiO2 layers were formed by electron‐beam evaporation of fused quartz.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…Amorphous SiOx/SiO2 multilayers were deposited on a p‐type crystalline Si (100) substrate by alternate vacuum evaporation of the corresponding initial materials, in accordance with the procedure used in (). The SiOx layers were produced by evaporation of SiO powder in a tantalum Knudsen effusion cell, while the SiO2 layers were formed by electron‐beam evaporation of fused quartz.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…The prepared structures contain silicon nanocrystals with average size of 2.5 and 3.5 nm, in keeping with by the thickness of the deposited a‐SiOx layers. Measurements by means of high performance transmission electron microscopy , have shown the coincidence of the average size of the silicon nanocrystals with the thickness of the initial a‐SiOx layer.…”
Section: Methodsmentioning
confidence: 99%
“…The layers were deposited on the silicon substrate at temperature 200C according to procedure described in Refs. . The structures were distinguished by the thickness of the layers of silicon suboxide .…”
Section: Methodsmentioning
confidence: 99%
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“…The possibility of thin‐layer formation with well‐expressed photoluminescence in the framework of silicon technologies is of great interest for technologists and researchers working on SiO 2 films containing silicon nanoparticles. The redundant silicon in the silicon dioxide matrix can be obtained by annealing the SiO x films formed from SiO powder . Under high‐temperature annealing of these films, SiO x decomposition to Si + SiO 2 should take place with the simultaneous self‐organization of silicon atoms in nanoclusters and/or nanocrystals.…”
Section: Introductionmentioning
confidence: 98%