2016
DOI: 10.1016/j.apsusc.2016.02.096
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Analysis of nitrogen species in titanium oxynitride ALD films

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Cited by 19 publications
(13 citation statements)
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“…[16][17][18][19][20][21][22] We have investigated the electronic properties of the Al 2 O 3 films prepared by different ALD processeso nd ifferent substrates. [16][17][18][19][20][21][22] We have investigated the electronic properties of the Al 2 O 3 films prepared by different ALD processeso nd ifferent substrates.…”
Section: Discussionmentioning
confidence: 99%
“…[16][17][18][19][20][21][22] We have investigated the electronic properties of the Al 2 O 3 films prepared by different ALD processeso nd ifferent substrates. [16][17][18][19][20][21][22] We have investigated the electronic properties of the Al 2 O 3 films prepared by different ALD processeso nd ifferent substrates.…”
Section: Discussionmentioning
confidence: 99%
“…The resPES characterization of the perovskite film was performed at the synchrotron radiation center BESSY‐II/HZB on the PMG2/U49‐2 beamline with the ASAM end‐station . The resPES measurement was carried out by collecting the VB spectra (2 eV–(−35) eV) at the nitrogen 1s absorption edge, by using photons from the energy range of 390 to 410 eV, and an energy step of 0.2 eV.…”
Section: Methodsmentioning
confidence: 99%
“…TiO x N y films were prepared by plasma enhanced ALD using tetrakis(dimethylamino)titanium (TDMAT) with N 2 plasma or TTIP with an NH 3 plasma, in the temperature range of 170–450 °C . Higher nitrogen contents in the films were obtained using a nitrogen‐rich TDMAT precursor and N 2 plasma, rather then using oxygen‐rich TTIP and NH 3 plasma.…”
Section: Thin Oxynitride Film As a Model System In Photoelectrochemicmentioning
confidence: 99%
“…Higher nitrogen contents in the films were obtained using a nitrogen‐rich TDMAT precursor and N 2 plasma, rather then using oxygen‐rich TTIP and NH 3 plasma. [10a] The O/N ratio in the TiO x N y films was found to be critical for the electric properties, such as conductivity, dielectric breakdown, and permittivity. [10b]…”
Section: Thin Oxynitride Film As a Model System In Photoelectrochemicmentioning
confidence: 99%
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