2009
DOI: 10.1016/j.jcrysgro.2008.09.127
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Analysis of impurity transport and deposition processes on the furnace elements during Cz silicon growth

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Cited by 26 publications
(22 citation statements)
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“…[11][12][13][14][15][16][17][18][19][20][21][22] Some of these previous investigations included only local simulations [11][12][13][14][15][16][17] that neglected the mass transport of the impurities in the gas phase. In other cases, the reported simulations included results of global simulations, [18][19][20][21] some of which only neglected mass transport of oxygen and carbon in the melt, 18) whereas others neglected carbon transfer for both the gas and the silicon melt. [19][20][21] The literature contains no reports of simulations that account for both the oxygen and carbon impurities in both the gas and the silicon melt.…”
Section: )mentioning
confidence: 99%
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“…[11][12][13][14][15][16][17][18][19][20][21][22] Some of these previous investigations included only local simulations [11][12][13][14][15][16][17] that neglected the mass transport of the impurities in the gas phase. In other cases, the reported simulations included results of global simulations, [18][19][20][21] some of which only neglected mass transport of oxygen and carbon in the melt, 18) whereas others neglected carbon transfer for both the gas and the silicon melt. [19][20][21] The literature contains no reports of simulations that account for both the oxygen and carbon impurities in both the gas and the silicon melt.…”
Section: )mentioning
confidence: 99%
“…In other cases, the reported simulations included results of global simulations, [18][19][20][21] some of which only neglected mass transport of oxygen and carbon in the melt, 18) whereas others neglected carbon transfer for both the gas and the silicon melt. [19][20][21] The literature contains no reports of simulations that account for both the oxygen and carbon impurities in both the gas and the silicon melt.…”
Section: )mentioning
confidence: 99%
“…in which K SiC = exp (9610/T − 3) [9], and where K SiC is the reaction equilibrium constant, A V is the specific surface area (by volume), and…”
Section: Simplified Model For the Generation Of Sicmentioning
confidence: 99%
“…Therefore, the dynamics of C contamination and the generation of SiC during the melting process need to be understood for controlling impurities in CZ-Si crystal growth. Most numerical studies [8][9][10] for C contamination in CZ-Si process have focused the analysis on the steady state of the diameter growth stage, using the quasi-steadystate assumption. Liu et al [11] recently addressed the generation and accumulation of C during the melting process in a CZ-Si furnace.…”
Section: Introductionmentioning
confidence: 99%
“…There have been a few studies using global simulations [8][9][10][11], however, they neglected the calculation of mass transfer of both the oxygen and carbon impurities in the silicon melt and gas phase. Almost all of the global simulations about impurities [8][9][10][11] were based on the Czochralski method; there has been no simulation based on the unidirectional solidification method for solar cells. Therefore, a global simulation in a unidirectional solidification furnace that considers all of the processes in crystal growth is needed.…”
Section: Introductionmentioning
confidence: 99%