An investigation of the surface energy and optical transmittance of copper oxide thin films prepared by reactive magnetron sputtering

Ogwu, A. A.; Bouquerel, E.; Ademosu, O.; Moh, S.; Crossan, E.; Placido, Frank

doi:10.1016/j.actamat.2005.07.035

Cited by 84 publications

(71 citation statements)

References 21 publications

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“…A very small particle size is observed for TiO 2 film, and there are signs of cluster formation, which are extremely small sized and closely packed. The surface smoothness of these films suggests that these films should be free of scattering losses, as a rough surface tends to produce scattering effects thus contributing to the loss of transparency of the film [11,12], restricting its uses. Also, such small particle sized films are strong enough, acting as non-permeable material to the moisture not allowing it to penetrate to the underlying layers and thus reducing the moisture sensitivity of the film or structure.…”

Section: Resultsmentioning

confidence: 99%

Wide bandpass optical filters with TiO2 and Ta2O5

et al. 2008

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Abstract:Complex multilayer thin film filters for optical applications have been designed, prepared and characterized in this work. E-beam reactive evaporation technique has been used as a deposition process. In the first stage, optimized individual film layers of TiO 2 , Ta 2 O 5 , and SiO 2 are deposited and characterized optically and structurally before the deposition of multilayered structures. The filter designs are based upon 33 layered SiO 2 /TiO 2 and SiO 2 /Ta 2 O 5 configurations on glass substrate. These designs are optimized to achieve wideband transmission in the visible spectrum. After deposition, the two filter configurations are characterized optically and structurally using spectrophotometery, atomic force microscopy (AFM), X-ray diffraction (XRD) and scanning electron microscopy (SEM). SiO 2 /Ta 2 O 5 /glass filter has been found sensitive to deposition conditions since high absorption is observed in multilayered configuration for the as-deposited samples. Post-deposition annealing of the filter in the temperature range 150 to 250˚C was also performed in order to study the effect of temperature on absorption and spectral characteristics of the filter. Comparison of the two filter configurations was also performed to analyze their suitability for optical applications. Adhesion of the two filters was found to be very good by means of tape-peel test. 42.79.Ci PACS (2008):

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Section: Resultsmentioning

confidence: 99%

Wide bandpass optical filters with TiO2 and Ta2O5

et al. 2008

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“…Self-organization, self-amplification and shape evolution in microcrystalline growth of Cu 2 O has been reported recently [5,6]. Cu 2 O thin films are prepared by many deposition techniques such as thermal oxidation [7], chemical deposition [8], reactive magnetron sputtering [9], pulsed laser deposition [10], plasma evaporation [11], electrodeposition [12,13], and among them electrodeposition is attractive because of its simplicity, low cost and low-temperature process. Wijesundera et al [14] reported electronic states and local structures for Cu ions in potentiostatically electrodeposited Cu 2 O thin films.…”

Section: Introductionmentioning

confidence: 99%

Effects of annealing on the properties and structure of electrodeposited semiconducting Cu–O thin films

Wijesundera

Hidaka²,

Koga

et al. 2007

Physica Status Solidi (b)

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The structures and the electronic states in electrodeposited semiconductor Cu -O thin films have been investigated for each annealing temperature (T A ) by X-ray diffraction (XD) and X-ray absorption spectroscopy (XAS) near the Cu K edge using synchrotron radiation. The thin films prepared as grown and annealed at T A ≤ 175 °C, 200 °C ≤ T A ≤ 300 °C, T A = 400 °C are characterized mainly by the pure Cu 2 O-type structure, the pseudo-Cu 2 O-type having a superlattice structure, and two phases of Cu 2 O-type and CuOtype structures, respectively, while the film annealed at T A = 500 °C is single-phase CuO-type. The XAS spectra suggest that there is a structural phase transition occurring at about 400 °C, which induces a modulation of the local structure around Cu ions observed in the extended X-ray absorption fine structure (EXAFS) and the occupational electronic band states of Cu-4p localized just above the Fermi level, taken from X-ray absorption near edge structure (XANES). The open-circuit voltage suggests that the photosensitivity of the Cu -O thin films strongly depends on the annealing treatment and shows a crossover from an n-type to a p-type semiconductor.

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“…11 An increase in contact angle i.e. increasing hydrophobicity with increasing silicon content will be shown to be correlated with a reduction in the polar component (γ p ) in our investigated Si-DLC films.…”

Section: B Surface Energy / Contact Anglementioning

confidence: 99%

The effect of PECVD plasma decomposition on the wettability and dielectric constant changes in silicon modified DLC films for potential MEMS and low stiction applications

2012

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We have carried out investigations aimed at understanding the mechanism responsible for a water contact angle increase of up to ten degrees and a decrease in dielectric constant in silicon modified hydrogenated amorphous carbon films compared to unmodified hydrogenated amorphous carbon films. Our investigations based on surface chemical constituent analysis using Raman spectroscopy, x-ray photoelectron spectroscopy (XPS), SIMS, FTIR, contact angle / surface energy measurements and spectroscopic ellipsometry suggests the presence of hydrophobic chemical entities on the surface of the films. This observation is consistent with earlier theoretical plasma chemistry predictions and observed Raman peak shifts in the films. These surface hydrophobic entities also have a lower polarizability than the bonds in the un-modified films thereby reducing the dielectric constant of the silicon modified films measured by spectroscopic ellipsometry. Ellipsometric dielectric constant measurement is directly related to the surface energy through Hamaker's constant. Our current finding is expected to be of benefit to understanding stiction, friction and lubrication in areas that range from nano-tribology to microfluidics.

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An investigation of the surface energy and optical transmittance of copper oxide thin films prepared by reactive magnetron sputtering

Cited by 84 publications

References 21 publications

Wide bandpass optical filters with TiO2 and Ta2O5

Wide bandpass optical filters with TiO2 and Ta2O5

Effects of annealing on the properties and structure of electrodeposited semiconducting Cu–O thin films

The effect of PECVD plasma decomposition on the wettability and dielectric constant changes in silicon modified DLC films for potential MEMS and low stiction applications

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