Abstract:This paper describes the design of a proximity effect test structure and electrical test method for estimating the magnitude of proximity effects in electron-beam lithography. The test structure consists of a van der Pauw cross resistor for measuring sheet resistance, a bridge resistor for measuring electrical linewidth, and a second bridge resistor simulating a close line-space environment for measuring electrical linewidth where proximity exposure effects from nearby patterns may be encountered. In this expe… Show more
scite is a Brooklyn-based organization that helps researchers better discover and understand research articles through Smart Citations–citations that display the context of the citation and describe whether the article provides supporting or contrasting evidence. scite is used by students and researchers from around the world and is funded in part by the National Science Foundation and the National Institute on Drug Abuse of the National Institutes of Health.