An AFM study of the topography of natural MoS2 following treatment in an RF–oxygen plasma

The Integration of Sub-10 nm Gate Oxide on MoS2 with Ultra Low Leakage and Enhanced Mobility

“…Also, no peaks appear around 236 eV, demonstrating that the molybdenum atoms were not oxidized after the plasma treatment 27 28 . This is different to the previous results where a direct RF-oxygen plasma was applied 25 26 28 . Based on the discussion above, it seems that remote oxygen plasma treatment is a surface-based process.…”

“…More details about the direct deposition of Al 2 O 3 on pristine MoS 2 basal planes are available in the Supplementary Information. According to previous reports with graphene 24 and MoS 2 25 26 , heavy exposure to an oxygen plasma (typically a direct plasma) completely etches the flakes and results in the substitution of sulfur with oxygen and re-deposition of the surface materials during etching of the MoS 2 flakes. Therefore, further analysis is needed to investigate the impact of the low energy remote oxygen plasma.…”

Oxide-mediated recovery of field-effect mobility in plasma-treated MoS 2

“…The associated quenching rate increases greatly with defect density, inhibiting the radiative recombination completely after 10 seconds of exposure (see Supplementary Figs. 13,14).…”

Oxidized Core–Shell MoO2–MoS2 Nanostructured Thin Films for Hydrogen Evolution

“…The change in the morphology of the nanoflakes, which is the appearance of mounds, is correlated with the MoS 2 oxidation as the oxygen plasma environment evidences both chemical and physical effects. First, the interaction of species starts at the edges of nanoflakes, defects such as vacancies, steps, kinks in the basal surfaces, , and the top few layers of MoS 2 gets oxidized as depicted in Figure . The surface of the nanoflakes is chemically modified, and this modification occurs in the lattice structure of MoS 2 by substitution of the oxygen species present in plasma for the sulfur in the nanoflakes.…”