Technical Digest., International Electron Devices Meeting
DOI: 10.1109/iedm.1988.32741
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An accurate model of subbreakdown due to band-to-band tunneling and its application

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Cited by 28 publications
(6 citation statements)
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“…This value is in the range of the doping concentration distribution given by process simulation. In addition, the value of the effective doping concentration is in good agreement with the assumption that the band-to-band tunneling current is at a maximum with a doping concentration about 3-4 Â 10 18 cm À3 for a T ox about 3-10 nm [6,9]. GIDL current measurements have been performed at different temperatures and drain voltages in order to determine the dependence of A and B on these two parameters.…”
Section: Resultsmentioning
confidence: 83%
See 1 more Smart Citation
“…This value is in the range of the doping concentration distribution given by process simulation. In addition, the value of the effective doping concentration is in good agreement with the assumption that the band-to-band tunneling current is at a maximum with a doping concentration about 3-4 Â 10 18 cm À3 for a T ox about 3-10 nm [6,9]. GIDL current measurements have been performed at different temperatures and drain voltages in order to determine the dependence of A and B on these two parameters.…”
Section: Resultsmentioning
confidence: 83%
“…In some models [8,9], the band-to-band tunneling current is calculated in the whole depletion zone. In this study, we consider only the tunneling effect of carriers that are at the Si-SiO 2 interface.…”
Section: Modeling Of Gidlmentioning
confidence: 99%
“…The design of the drift region, such as by varying the doping concentration or the length of drift region, in high-voltage MOS transistors has been shown to produce a serious impact on V BD and hot-carrier-induced degradation of the device. [23][24][25][26][27][28] Our previous work has shown that high-voltage n-type MOS transistors using a gradual junction structure in the drift region have improved V BD without sacrificing device drivability. 29) In this study, high-voltage n-type MOS transistors with traditional and gradual junctions in the N − drift region are further investigated for devices with two different dimensions.…”
Section: Introductionmentioning
confidence: 99%
“…[1][2][3][4][5][6][7] The suppression of GIDL to improve off-state V BD has been reported by using dose optimization in the N-type minus (N-) drift region or structure modification. [8][9][10][11][12][13] However, most of the methods to improve off-state V BD also cause other side effects such as drivability current (I Dsat ) drop and on-resistance (R ON ) increase.…”
Section: Introductionmentioning
confidence: 99%